COA Array Substrate Electrochemical Quantum Dot Deposition
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Solution Overview
Problem
The manufacturing of quantum dot color films for display devices faces challenges such as poor heat resistance, high cost, toxicity, and wastefulness of quantum dots, as well as alignment difficulties in COA technology, leading to increased research costs and environmental pollution.
Innovation Solution
A method for manufacturing a COA array substrate using electrochemical deposition to form quantum dot color filter films with red, green, and blue filter layers on a TFT substrate, utilizing a weak acidic solution containing quantum dots and chitosan, which reduces quantum dot consumption, costs, and environmental impact, while improving alignment precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If quantum dot photoresist is used in conventional TFT photoresist process, then color gamut and penetration rate are improved, but heating temperature must be reduced which increases research costs
Solution Approach 1:
The patent changes the temperature parameter from conventional high-temperature processing (>200°C) to low-temperature electrochemical deposition (<100°C), making the process compatible with quantum dot photoresist while maintaining color gamut improvements
Solution Approach 2:
The patent replaces the thermal field (conventional photoresist heating) with an electrochemical field (electrochemical deposition), eliminating the need for high-temperature processing and enabling quantum dot photoresist application
2Quantity of substance
If quantum dots are used in photoetching process, then color reproduction ability is improved, but quantum dots are washed off during developing which causes waste and environmental pollution
Solution Approach 1:
The patent replaces the photoetching process with electrochemical deposition, changing from a washing-based development process to a deposition-based formation process, which prevents quantum dot washing off and reduces waste
Solution Approach 2:
The electrochemical deposition process allows quantum dots to self-assemble and deposit onto the substrate through electrochemical reactions, eliminating the need for washing steps that cause quantum dot loss
3Ease of manufacture
If conventional photoetching process is used for quantum dot photoresist, then color filter film is formed, but two or three photoetching processes are required which increases cost
Solution Approach 1:
The patent combines multiple photoetching processes into a single electrochemical deposition process, where red, green, and blue quantum dot layers are deposited in one integrated workflow, reducing the number of steps from two or three to one
Solution Approach 2:
The electrochemical deposition process serves multiple functions simultaneously: it forms the color filter film, patterns the quantum dot layers, and controls the deposition thickness, replacing multiple specialized photoetching steps
4Ease of manufacture
If color film substrate and array substrate are aligned in COA technology, then color filter film is formed, but alignment difficulties increase manufacturing complexity
Solution Approach 1:
The patent extracts the color filter film formation process from the alignment-dependent CF substrate approach and integrates it directly onto the array substrate through electrochemical deposition, eliminating the alignment step entirely
Solution Approach 2:
The patent segments the manufacturing process into direct deposition steps on the array substrate, where each color layer is deposited independently in its designated region, eliminating the need for alignment between separate substrates
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method achieves efficient utilization of quantum dots, eliminates the need for high-temperature processes, and reduces the number of photoetching steps, resulting in lower costs and environmental protection, while enhancing color display effects and aperture opening ratio by preventing light leakage due to improved alignment.
Implementation Method 1
forming a quantum dot color filter film containing red, green, and blue filter layers on a TFT substrate by electrochemical deposition
Implementation Method 2
a weak acidic solution containing a mixture of red quantum dots and chitosan
Data Source
AI summary
The present disclosure provides a method for manufacturing a COA array substrate and a COA array substrate. The method for manufacturing a COA array substrate according to the disclosure utilizes properties of a pixel electrode pattern on the TFT substrate and solubility of chitosan varying according to different pH values to form a quantum dot color filter film containing red filter layers, green filter layers, and blue filter layers on the TFT substrate by electrochemical deposition, quantum dots are dispersed in the electrolyte before formed to be a film, only one property change is that concentration of quantum dots in the electrolyte decreases, the electrolyte can be recycled after being supplied with quantum dots, which can achieve 100% utilization of quantum dots.