Coating Solution for Finer Resist Patterns
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Solution Overview
Problem
Conventional methods for forming finer resist patterns face challenges such as thermal degradation of patterns during heat treatment and precipitation issues when using aqueous solutions, leading to inefficient process throughput and difficulty in controlling pattern size.
Innovation Solution
A coating solution comprising a specific polymer, amine, and ester is developed, which allows for the formation of finer patterns through controlled heat treatment and prevents precipitation, enabling efficient pattern reduction and compatibility with general photoresist compositions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If thermal shrinkage is utilized in the coating agent for forming a finer pattern, then the pattern size is reduced, but the heat treatment temperature must be equal to or higher than the PEB temperature, which degrades the shape of the fabricated pattern
Solution Approach 1:
The invention changes the chemical composition parameters of the coating agent by incorporating a polymer with carboxyl groups and specific side chain structures, which enables pattern formation at lower temperatures without requiring high-heat thermal shrinkage treatment, thus avoiding pattern degradation while achieving size reduction
Solution Approach 2:
The coating agent uses a composite polymer structure combining main chain units with carboxyl groups and specific side chain units, creating a material that achieves both pattern size reduction and shape preservation through its unique molecular architecture rather than relying on high-temperature thermal effects
2Manufacturing precision
If an aqueous solution is used as a coating agent for forming a finer pattern, then the pattern can be formed, but the developing solution mixes with the coating agent in the same cup, causing resin precipitation and requiring separate cups, which decreases throughput
Solution Approach 1:
The invention changes the solvent system from aqueous to organic solvent-based, which prevents mixing incompatibility with the developing solution, allowing both coating and development steps to be performed in the same cup without resin precipitation, thereby maintaining fine pattern formation capability while improving throughput
Solution Approach 2:
The organic solvent-based coating agent is designed to be universally compatible with the development process, enabling a single cup to serve multiple functions for both coating application and subsequent development, eliminating the need for separate cups and streamlining the manufacturing process
3Manufacturing precision
If the pattern size reduction depends on the chemical structure of the resin, then fine patterns can be formed, but the reduction width is difficult to control
Solution Approach 1:
The invention introduces controllable parameters through the polymer's side chain structure, where the length and composition of side chains (containing ester groups and other functional groups) can be adjusted to precisely control the degree of pattern reduction, providing both fine pattern formation and ease of control
Solution Approach 2:
The polymer structure is designed with dynamic controllability through variable side chain configurations, allowing the pattern reduction width to be adjusted and optimized based on specific manufacturing requirements while maintaining the ability to form fine patterns
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the formation of finer patterns with controlled size reduction, improves manufacturing efficiency by preventing precipitation, and maintains compatibility with standard photoresist compositions, potentially enhancing EUV exposure capabilities.
Implementation Method 1
an ester capable of dissolving the polymer and the amine
Implementation Method 2
thermal shrinkage is utilized in the coating agent for forming a finer pattern
Data Source
AI summary
A coating solution has a polymer having a formula (1) structural unit, a formula (2) primary, secondary, or tertiary amine, and a formula (3) ester capable of dissolving the polymer and amine:R1 is a hydrogen atom or methyl group. L is a divalent aromatic group optionally having at least one substituent, —C(═O)—O— group, or —C(═O)—NH— group. The —C(═O)—O— or —C(═O)—NH— group carbon atom is attached to a polymer main chain. X is a hydrogen atom or linear or branched alkyl or alkoxy group having a 1-10 carbon atom number. At least one alkyl group hydrogen atom is optionally substituted with a halogen atom or hydroxy group. R2, R3, and R4 are independently a hydrogen atom, hydroxy group, or linear, branched, or cyclic organic group having a 1-16 carbon atom number. R5 and R6 are each independently a linear or branched organic group having a 1-16 carbon atom number.