Coaxial Laser Patterning Apparatus for Distortion-Free Defect Inspection
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Solution Overview
Problem
Existing patterning apparatuses face challenges in quickly and accurately inspecting defects in patterns on display substrates due to the need for separate movement and alignment of image photographing devices, which can introduce distortion and complicate the detection process.
Innovation Solution
A patterning apparatus that uses a laser generator to emit a first laser beam for pattern formation and a second laser beam for defect inspection, with both beams being coaxially irradiated onto the substrate using a fixed lens unit, allowing for immediate defect detection without separate movement or alignment, and converting reflected beams into electrical signals for image generation and defect analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a separate image photographing device is used for defect inspection, then defect detection capability is improved, but device complexity and alignment requirements increase
Solution Approach 1:
The patent combines the pattern formation function and defect inspection function into a single integrated apparatus. The same optical system and stage are used for both writing patterns and inspecting them, eliminating the need for separate image photographing devices and reducing alignment complexity between multiple devices.
Solution Approach 2:
The patterning apparatus is designed to perform multiple functions: pattern formation using laser beams and defect inspection using reflected beam analysis. This multi-functional design allows the same equipment to both create and inspect patterns, reducing the need for additional specialized devices.
2Measurement precision
If separate movement and alignment of imaging devices is performed, then defect inspection capability is improved, but inspection time and process complexity increase
Solution Approach 1:
The inspection process is merged with the pattern formation process in time and space. Since the same apparatus performs both functions, defect inspection can be performed immediately after or during pattern formation without requiring separate movement and alignment operations, significantly reducing inspection time.
Solution Approach 2:
The apparatus is pre-configured with the optical paths and components positioned for both pattern formation and inspection. This preliminary setup eliminates the need for real-time movement and alignment during the inspection process, allowing immediate defect detection.
3Adaptability or versatility
If different laser beams are used for pattern formation and inspection, then functional versatility is improved, but system complexity increases
Solution Approach 1:
The laser system is segmented into different laser beams with different intensities, where the first laser beam is used for pattern formation and the second laser beam is used for defect inspection. This segmentation allows each beam to be optimized for its specific function while maintaining a relatively simple overall system architecture.
Solution Approach 2:
Different regions of the optical system are assigned different qualities: the first laser beam path is optimized for high-intensity pattern formation, while the second laser beam path is optimized for low-intensity defect inspection. This local optimization allows functional versatility without requiring complete system redesign.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid and accurate detection of pattern defects and attributes without distortion, reducing the need for separate alignment and movement of imaging devices, and utilizing the same components for pattern formation and inspection, thereby improving efficiency and precision.
Implementation Method 1
a laser generator to generate a first laser beam and a second laser beam having different intensities
Implementation Method 2
to condense reflected beams generated as the second laser beam is reflected from the substrate
Implementation Method 3
a beam distributor to transmit the first and second laser beams emitted from the laser generator to the at least one lens, to refract the reflected beams emitted from the at least one lens
Implementation Method 4
a detector to convert the reflected beams to electrical signals
Data Source
AI summary
A patterning apparatus includes a laser generator, at least one lens, a detector, and a controller. The laser generator generates a first laser beam and a second laser beam having different intensities. The at least one lens irradiates the first laser beam to form a pattern in a substrate, irradiates a second laser beam to determine a defect of the pattern, and condenses reflected beams generated as the second laser beam is reflected from the substrate. The detector converts the reflected beams to electrical signals. The controller determines a defect of the pattern based on the electrical signals.