Cobalt Precursor Additive Sludge Prevention
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Solution Overview
Problem
Cobalt deposition in microelectronic devices faces instability due to sludge formation in delivery ampoules, which decreases deposition rates and impairs liquid level sensors, leading to reduced stability and efficiency in cobalt film formation.
Innovation Solution
Incorporating a low volatility liquid dispersant or solid additive, such as a metal organic framework, into the cobalt precursor ampoule to solubilize non-volatile decomposition products, preventing sludge formation and maintaining the precursor as a free-flowing liquid, thereby stabilizing the deposition process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a cobalt precursor is used in a delivery ampoule for CVD processes, then cobalt film deposition can be performed, but sludge forms in the ampoule due to decomposition of the cobalt precursor
Solution Approach 1:
A liquid dispersant is introduced as an intermediary substance in the ampoule to interact with the cobalt precursor and its decomposition products. The dispersant prevents sludge formation by maintaining the precursor in a stable, dissolved state throughout the deposition process, thereby eliminating the harmful sludge accumulation while enabling continuous cobalt film deposition.
2Reliability
If sludge forms in the ampoule, then deposition rates decrease and liquid level sensors are impaired, but adding a liquid dispersant prevents sludge formation and maintains deposition stability
Solution Approach 1:
The physical and chemical parameters of the ampoule contents are changed by introducing a liquid dispersant. This alters the solubility, viscosity, and decomposition characteristics of the cobalt precursor system, transforming it from a state that produces sludge to a stable, homogeneous solution that maintains consistent deposition parameters throughout the process.
3Productivity
If the cobalt precursor decomposes, then cobalt film can be deposited, but non-volatile decomposition products accumulate as sludge
Solution Approach 1:
The harmful non-volatile decomposition products are converted into a beneficial component of the system by dissolving them in the liquid dispersant. Instead of accumulating as harmful sludge, these decomposition products remain in solution, allowing the deposition process to continue uninterrupted while the dispersant manages the waste products.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of additives significantly increases the stability and throughput of cobalt deposition processes, preventing sludge formation and maintaining the ampoule's functionality, enabling high-volume manufacturing of cobalt films for microelectronic devices.
Implementation Method 1
non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule
Implementation Method 2
The additives in the ampoule improve the performance of the cobalt precursor by eliminating sludge formation in the ampoule coupled with the deposition tool system
Data Source
AI summary
Methods of forming cobalt films utilizing a cobalt precursor comprising an additive are described. Those methods may include adding an additive to a cobalt precursor, wherein the cobalt precursor is located in an ampoule that is coupled with a deposition tool, and then forming a cobalt film using the cobalt precursor comprising the additive. Non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule.