Multi-Component Coiled Sputtering Target for Uniform Refractory Alloy Deposition
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Solution Overview
Problem
Cylindrical magnetron sputtering devices face challenges in achieving uniform target material erosion and efficient production of refractory metal alloy films, particularly due to non-uniform erosion patterns in planar targets and limitations in producing specific alloy compositions.
Innovation Solution
A multi-component sputtering target structure with coiled components of different materials, such as refractory metals, is used in cylindrical magnetron sputtering, where the components alternate along the length and interlock to create contact regions, allowing for simultaneous sputtering and adjustable alloy composition through varying component dimensions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If planar magnetron sputtering targets are used, then the target material can be sputtered to form films, but the erosion is non-uniform with maximum erosion in a racetrack pattern centered around the magnet position, rendering the target unusable after use even while relatively large amounts of useful target material still remain
Solution Approach 1:
The target structure is divided into multiple segmented components (first target component, second target component, third target component) arranged in alternating pattern around the magnet assembly. Each segment can be independently sputtered, allowing uniform erosion across all segments while maintaining overall target functionality. This segmentation prevents the racetrack erosion problem by distributing the sputtering load across multiple discrete target areas.
Solution Approach 2:
The invention transitions from a planar target configuration to a three-dimensional cylindrical target structure with components arranged circumferentially around the magnet assembly. This dimensional change allows the magnetic field to interact with multiple target surfaces simultaneously in different spatial locations, achieving uniform erosion patterns and maximizing target material utilization.
2Adaptability or versatility
If multiple materials are sputtered simultaneously to produce alloy films, then diverse alloy compositions can be achieved, but controlling the homogeneity and precise composition of the alloy film becomes problematic
Solution Approach 1:
Different target components are positioned at specific locations around the magnet assembly to control the local deposition of different materials. The first, second, and third target components can be made of different materials and are arranged to ensure uniform distribution of sputtered atoms across the substrate, achieving homogeneous alloy films with precise compositional control.
Solution Approach 2:
The target assembly uses a composite structure with multiple target components made of different materials (e.g., refractory metals like tungsten, molybdenum, tantalum) arranged in alternating pattern. This composite target configuration enables simultaneous sputtering of multiple materials with controlled stoichiometry, producing homogeneous alloy films with tailored compositions.
3Ease of operation
If cylindrical magnetron sputtering is used to coat cylindrical workpieces, then the inside surfaces of pipes and cylindrical objects can be coated, but achieving uniform coating and efficient material utilization remains challenging
Solution Approach 1:
The target structure is designed with cylindrical geometry matching the workpiece curvature. The magnet assembly and target components are arranged in a cylindrical configuration that conforms to the inside surface of cylindrical workpieces, ensuring uniform magnetic field distribution and consistent coating thickness across the entire workpiece surface.
Solution Approach 2:
The cylindrical target assembly with alternating target components serves multiple functions simultaneously: it coats cylindrical workpieces uniformly, maximizes target material utilization through distributed erosion, and enables production of various alloy compositions by adjusting the material composition and arrangement of different target components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient production of homogeneous refractory metal alloy films with controlled composition, overcoming the limitations of uniformity and material utilization in existing cylindrical magnetron sputtering techniques.
Implementation Method 1
a magnet assembly arranged around an inner circumference of the target support and configured to create a magnetic field around the target structure
Implementation Method 2
cylindrical magnetron sputtering devices are used to coat cylindrical workpieces
Implementation Method 3
creating a plasma field between the sputtering target structure and the workpiece
Data Source
AI summary
Multi-component sputtering target structures suitable for deposition of metallic alloy films are provided. The multi-component target may be formed by winding wires of different materials around a target support structure to form a dense winding. The sputtering target structures and methods of the invention can be used to produce a variety of refractory metal alloy films.