Cold Cathode Sputter Ion Pump with Saddle Electrostatic Field

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Solution Overview

Problem

Conventional sputter ion pumps are large, heavy, costly, and prone to magnetic leakage, with complex structures and high power consumption due to the use of hot cathodes, limiting their effectiveness in maintaining stable discharge in high vacuum levels and requiring a magnetic field.

Innovation Solution

A sputter ion pump with a saddle-shaped electrostatic field and a cold cathode electron emitter, featuring parallel anode poles and a secondary electron emitter with a high secondary electron emission coefficient, eliminates the need for a magnetic field, simplifying the structure and reducing power consumption by using a field emission device for electron injection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional sputter ion pump with hot cathode is used, then discharge stability in high vacuum levels is improved, but device complexity and power consumption increase

Engineering Contradiction:
Improvedischarge stabilityVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts and removes the hot cathode component from the sputter ion pump system, replacing it with a cold cathode electron emission device. This extraction eliminates the need for complex heating mechanisms and thermal management systems while maintaining electron emission functionality through field emission or other cold cathode mechanisms, thereby reducing device complexity without sacrificing discharge stability

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent substitutes the thermal field (heat-based electron emission) with an electric field (cold cathode electron emission). By using strong electric fields to extract electrons directly from the cathode surface without thermal heating, the system replaces complex thermal management infrastructure with simpler electrical field control, reducing mechanical and thermal subsystem complexity while maintaining reliable electron emission for discharge stability

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Productivity

If a conventional sputter ion pump with magnetic field is used, then gas evacuation capability is improved, but magnetic leakage occurs affecting peripheral measuring apparatus

Engineering Contradiction:
Improvegas evacuation capabilityVSAvoidmagnetic leakage
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent extracts and removes the magnetic field generation system from the sputter ion pump, eliminating the source of magnetic leakage that interferes with peripheral measuring apparatus. The gas evacuation capability is maintained through optimized electrostatic field configurations and electron emission mechanisms that do not require magnetic field confinement, thereby eliminating harmful magnetic effects while preserving productivity

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent substitutes the magnetic field system with an electrostatic field system for controlling electron trajectories and maintaining discharge. By using electric fields instead of magnetic fields to guide and confine electrons, the system eliminates magnetic leakage that affects external measuring instruments while maintaining effective gas evacuation through electrostatically-controlled electron-gas molecule interactions

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If a conventional sputter ion pump is used, then gas evacuation function is achieved, but device size and weight increase

Engineering Contradiction:
Improvegas evacuation functionVSAvoiddevice weight
Core Design Contradiction:
ProductivityVSWeight of stationary object

Solution Approach 1:

The patent segments the sputter ion pump into a compact modular design with integrated cold cathode electron emission, saddle-shaped electrostatic field generation, and sputtering surfaces. This segmentation allows for optimized spatial arrangement and miniaturization of individual components, reducing overall device volume and weight while maintaining effective gas evacuation function through concentrated and efficient electron emission zones

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs a nested configuration where the cold cathode electron emission device, electrostatic field-generating electrodes, and sputtering surfaces are arranged in concentric or layered configurations. This nesting maximizes the use of internal space, allows multiple functional surfaces to occupy overlapping volumes, and reduces the overall envelope dimensions, thereby decreasing device size and weight while preserving gas evacuation capability

Inventive Principle:
Principle #7Nested doll (Nesting)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution provides a more efficient and cost-effective vacuum pump with improved discharge stability in high vacuum levels, reduced power consumption, and a simpler structure, effectively evacuating gases without magnetic interference, suitable for high vacuum applications.

Implementation Method 1

cold cathode electron emitter... using a field emission device for electron injection

Methodology Applied
Scientific EffectField emission: Electron Beam

Implementation Method 2

sputter ion pump with a saddle-shaped electrostatic field... The two parallel anode poles are positioned in the vacuum chamber and are arranged in a symmetrical configuration

Methodology Applied
Scientific EffectElectrostatic field: Electric Field

Implementation Method 3

The cathode electrode is subjected to a sputtering process by means of the ionized gas molecules activating the surfaces thereof. The ionized gas molecules are absorbed on and/or embedded in the active surfaces of the cathode electrode

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS7819633B2Sputter ion pump
Publication Date: 2010.10.26 HON HAI PRECISION INDUSTRY CO LTD
  • US7819633B2 patent drawing
  • US7819633B2 patent drawing
  • US7819633B2 patent drawing

AI summary

A sputter ion pump includes one vacuum chamber, two parallel anode poles and one cold cathode electron emitter. The vacuum chamber includes at least one aperture located in an outer wall thereof. The two parallel anode poles are positioned in the vacuum chamber and arranged in a symmetrical configuration about a center axis of the vacuum chamber. The cold cathode electron emission device is located on or proximate the outer wall of the vacuum chamber and faces a corresponding aperture. The cold cathode electron emission device is thus configured for injecting electrons through the corresponding aperture and into the vacuum chamber. The sputter ion pump produces a saddle-shaped electrostatic field and is free of a magnetic field. The sputter ion pump has a simplified structure and a low power consumption.