Adjustable Collection Cup Height for Substrate Solution Rebound Control

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Solution Overview

Problem

Existing substrate treating apparatuses face challenges in efficiently collecting treatment solutions scattered from substrates due to varying process conditions, leading to rebound and inefficient collection.

Innovation Solution

A substrate treating apparatus with a collection cup that adjusts its height based on treatment solution flow rate information, minimizing rebound and optimizing collection efficiency by varying the distance from the substrate to the top end of the collection container inlet.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the collection container height is fixed, then the device structure is simple, but the collection efficiency decreases under varying process conditions

Engineering Contradiction:
Improvecollection efficiencyVSAvoiddevice structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The collection container height is made adjustable through a lifting mechanism that can change the container's position vertically. This dynamic adjustment allows the system to adapt to different treatment solution flow rates and scattering characteristics, optimizing collection efficiency for various process conditions while maintaining a relatively simple overall device structure.

Inventive Principle:
Principle #15Dynamics

2Productivity

If the collection container is positioned higher to collect scattered treatment solution, then the collection efficiency improves, but the treatment solution rebounds from the container

Engineering Contradiction:
Improvecollection efficiencyVSAvoidtreatment solution rebound
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The system dynamically adjusts the collection container height based on the treatment solution flow rate. At lower flow rates, the container is positioned higher to maximize collection of scattered solution. At higher flow rates, the container position is adjusted to prevent rebound, thereby optimizing collection efficiency while minimizing harmful rebound effects across different operating conditions.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The lifting mechanism changes the vertical position parameter of the collection container according to the treatment solution flow rate parameter. This parameter adjustment allows the system to optimize the balance between collection efficiency and rebound prevention by matching the container position to the kinetic energy characteristics of the scattered treatment solution.

Inventive Principle:
Principle #35Parameter changes

3Productivity

If the collection container height is adjusted for different flow rates, then the collection efficiency improves, but the device operation becomes more complex

Engineering Contradiction:
Improvecollection efficiencyVSAvoidoperation complexity
Core Design Contradiction:
ProductivityVSEase of operation

Solution Approach 1:

The control unit receives feedback information about the treatment solution flow rate and automatically adjusts the collection container height accordingly. This closed-loop control system simplifies operation by eliminating the need for manual intervention, as the system self-adjusts based on real-time process conditions while maintaining optimal collection efficiency.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The lifting mechanism is automatically controlled by the control unit based on pre-programmed relationships between flow rate and optimal container position. The system serves itself by automatically making the necessary height adjustments without requiring operator intervention, thereby improving collection efficiency while keeping the operation simple and automated.

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS20250135510A1Substrate treating apparatus and substrate treating method
Publication Date: 2025.05.01 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20250135510A1 patent drawing
  • US20250135510A1 patent drawing
  • US20250135510A1 patent drawing

AI summary

Disclosed is a substrate treating apparatus including: a substrate support unit for supporting and rotating a substrate; a liquid supply unit for supplying a treatment solution onto the substrate; a collection cup provided to surround the substrate support unit, and having a plurality of collection spaces for collecting a treatment solution scattered from the substrate; a lifting unit for changing a relative position between the collection cup and the substrate; and a controller for controlling the lifting unit to vary a relative height between the substrate and the collection cup in accordance with a process recipe for treating the substrate.