Collimated Energy Source for Substrate Temperature Control
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Solution Overview
Problem
In semiconductor processing, achieving uniform and repeatable properties in deposited layers is challenging due to variations in substrate temperature, gas flows, and precursor concentrations, particularly in deposition processes like CVD, where non-collimated heat sources complicate temperature control and introduce contaminants.
Innovation Solution
A substrate processing apparatus with a vacuum chamber featuring a collimated energy source positioned proximate to a second dome, with at least a portion of the second dome and substrate support being optically transparent, allowing for precise temperature control and uniform heating of the substrate using collimated energy sources like lasers or LEDs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If non-collimated heat sources (heat lamps) are used to heat the substrate, then the substrate can be heated to the required temperature, but the thermal energy is highly diffusive making temperature control complicated and introducing contaminants into the chamber
Solution Approach 1:
The patent extracts the harmful diffusive thermal energy and contaminants from the heating system by replacing external heat lamps with an internal collimated energy source. The collimated energy source is positioned inside the vacuum chamber to directly heat the substrate without introducing contaminants or creating highly diffusive thermal fields that complicate temperature control.
Solution Approach 2:
The patent replaces the mechanical/optical heat lamp system with an electrical collimated energy source (such as a laser or LED array) that generates directed thermal energy. This substitution eliminates the need for external lamp positioning and shielding mechanisms, simplifying the overall system while improving temperature control precision.
2Temperature
If non-collimated heat sources are used, then heating can be provided, but thermal absorptions and emissions of chamber components and exposure of sensors and chamber surfaces to layer forming conditions complicate temperature control
Solution Approach 1:
The collimated energy source provides localized heating directly at the substrate position, creating a focused thermal field that minimizes thermal interactions with other chamber components. This localized heating approach ensures that sensors and chamber surfaces are not exposed to excessive thermal energy, reducing their thermal absorptions and emissions that would otherwise complicate temperature control and affect layer uniformity.
3Object-affected harmful factors
If external heat lamps are positioned outside the vacuum chamber, then contaminants are avoided, but the highly diffusive thermal energy complicates substrate temperature control
Solution Approach 1:
The patent introduces an optically transparent window as an intermediary element that allows the collimated energy source to be positioned outside the vacuum chamber while still delivering directed thermal energy to the substrate. This window transmits the collimated energy without significant absorption or diffusion, maintaining the benefits of both external positioning (avoiding contaminant introduction) and internal heating (precise temperature control).
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables improved temperature control and uniform layer formation by minimizing thermal energy diffusion and absorption, resulting in more consistent film thickness, composition, and structure, while avoiding contamination from external heat sources.
Implementation Method 1
at least a portion of the second dome and the substrate support are optically transparent to collimated energy from the collimated energy source
Implementation Method 2
the substrate is heated to a temperature that favors growth of a material layer having desired properties
Data Source
AI summary
Embodiments described herein provide a substrate processing apparatus that includes a vacuum chamber comprising a first dome and a second dome, a substrate support disposed inside the vacuum chamber between the first and second domes, a collimated energy source arranged in a compartmented housing and positioned proximate the second dome, wherein the second dome is between the collimated energy source and the substrate support. At least a portion of the second dome and the substrate support may be optically transparent to the collimated energy from the collimated energy source.