Collimator with Segmented Walls for Sputtering Particle Alignment
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Solution Overview
Problem
The collimator in sputtering apparatuses struggles to effectively align particles within a predetermined direction, leading to inefficiencies in film deposition due to the blocking of usable, obliquely flying particles and unnecessary particles.
Innovation Solution
The collimator design incorporates shield walls and communicating walls with strategically arranged through holes and passages, allowing vertically inclined particles within a specific range to pass through while blocking those outside this range, ensuring controlled particle alignment and improved sputtering efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the collimator uses walls with through holes to block obliquely flying particles, then particle alignment precision is improved, but usable oblique particles are blocked causing loss of substance
Solution Approach 1:
The collimator walls are segmented into multiple sections with different through-hole patterns. Each section has through holes arranged at specific intervals and orientations to selectively transmit particles within certain angular ranges while blocking others, thereby reducing unnecessary particle loss while maintaining alignment precision.
Solution Approach 2:
Different regions of the collimator walls have locally optimized through-hole configurations. The through holes are strategically positioned and sized to match the angular distribution of sputtered particles at different locations, allowing local adaptation to the particle flux pattern and minimizing loss of usable particles.
2Manufacturing precision
If the collimator blocks all oblique particles to improve film uniformity, then manufacturing precision is improved, but particle flux decreases reducing productivity
Solution Approach 1:
The collimator design incorporates adjustable elements that allow dynamic optimization of the through-hole configuration. The system can adapt the blocking characteristics to match the specific deposition requirements, balancing film uniformity with deposition rate by adjusting which angular ranges are transmitted or blocked.
3Productivity
If the collimator uses a dense array of through holes to maximize particle transmission, then productivity is improved, but particle alignment precision deteriorates
Solution Approach 1:
The through-hole array exhibits asymmetric distribution patterns that are optimized for the directional nature of sputtered particles. The holes are positioned and oriented to match the angular distribution of particle flux, allowing higher transmission in the dominant particle direction while maintaining alignment control through strategic placement in less intensive regions.
Data Source
AI summary
According to an embodiment, a processing apparatus includes a generator mount, a first-object mount, and a first collimator. A particle generator capable of emitting particles is placed on the generator mount. A first object is placed on the first-object mount. The first collimator is placed between the generator mount and the first-object mount, and has first walls and second walls. In the first collimator, the first walls and the second walls form first through holes extending in a first direction from the generator mount to the first-object mount. Each of the second walls is provided with at least one first passage.