Colloidal Dispersion Mixing via Turbulent Flow
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Solution Overview
Problem
Existing methods for forming colloidal dispersions in semiconductor fabrication, such as chemical mechanical planarization (CMP), face challenges in achieving stable and long-term dispersions due to particle agglomeration and microgellation, particularly at the isoelectric potential of the colloidal dispersion, which affects the shelf-life and stability of the slurry.
Innovation Solution
A method involving the combination of continuous material flows with a Reynolds number between 4400 and 25000, using a diluent, acid, and abrasive particle solution, with optional additives like corrosion inhibitors and surfactants, to create a colloidal dispersion that maintains stability through turbulent mixing, reducing the likelihood of particle agglomeration and microgellation by rapidly changing the pH through the isoelectric potential.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If conventional mixing methods are used to form colloidal dispersion, then the mixing process is simple, but particle agglomeration and microgellation occur leading to poor stability
Solution Approach 1:
The patent applies parameter changes by controlling the Reynolds number of the flowing materials to be within a specific range (4400-25000) to achieve turbulent flow conditions that prevent particle agglomeration and microgellation, thereby improving colloidal dispersion stability without requiring complex mixing equipment
Solution Approach 2:
The patent utilizes hydraulic principles by employing continuous flowing materials in a controlled turbulent flow regime to achieve homogeneous mixing and prevent particle aggregation, replacing conventional mechanical mixing methods with flow-based mixing that maintains dispersion stability
2Reliability
If the colloidal dispersion is prepared to maintain stability, then particle agglomeration is reduced, but the process requires continuous monitoring and adjustment
Solution Approach 1:
The patent implements continuity of useful action by using continuous flowing materials that maintain turbulent flow conditions throughout the mixing process, ensuring consistent dispersion stability without requiring intermittent monitoring or adjustment, thereby improving both reliability and productivity
Solution Approach 2:
The patent applies self-service by designing a system where the continuous turbulent flow automatically maintains dispersion stability through its inherent mixing action, eliminating the need for external monitoring and adjustment mechanisms while ensuring consistent product quality
3Stability of the object's composition
If rapid pH change through isoelectric potential is used, then microgellation is prevented, but control precision requirements increase
Solution Approach 1:
The patent uses hydraulic flow control to achieve rapid and uniform pH changes through the isoelectric potential by controlling the continuous turbulent flow of materials, thereby preventing microgellation without requiring high-precision pH measurement and adjustment systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in a colloidal dispersion with robust, long-term stability and reduced downtime for equipment operation, as it facilitates continuous turbulent mixing that prevents salt formation and microgellation, enhancing the shelf-life and operational efficiency of the CMP process.
Implementation Method 1
combining the first and second continuous material flows with a Reynolds number greater than about 4400 and less than about 25000
Implementation Method 2
The combination of the first and second material flows increases or decreases the pH through the isoelectric potential of the colloidal dispersion
Data Source
AI summary
A method of forming a colloidal dispersion includes providing a first continuous material flow, providing a second continuous material flow, combining the first and second continuous material flows, and moving a continuous flow of a colloidal dispersion in a direction downstream of the first and second continuous flows. The first continuous material flow includes one or more of a diluent (e.g., deionized water), a base, and an acid, and the second continuous material flow includes an abrasive particle solution. The first and second material flows are combined with a Reynolds number greater than about 4400 and less than about 25000 (e.g., about 7400 to about 25000). The colloidal dispersion includes the diluent, the base, the acid, and abrasive particles from the abrasive particle solution.


