Color Filter Manufacturing with Overlapping Boundaries
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Solution Overview
Problem
The existing color filters in liquid crystal displays suffer from 'horns' in the color resistance layer, leading to dark lines at pixel edges due to overlapping boundaries, which deviate the line width/line space of the conductive film and cause chaotic liquid crystal orientations, reducing light transmittance.
Innovation Solution
A method for manufacturing a color filter involves forming color resistances with overlapping boundaries using a photoresist material exposed with reduced light intensity at the boundaries, employing a half-tone mask or a mask with light shading portions to minimize horn formation, resulting in a thinner boundary and reduced horn generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If adjacent color resistances are overlapped to avoid breaking the second substrate and conductive film, then reliability is improved, but horns are formed at the boundaries which cause dark lines at pixel edges
Solution Approach 1:
The patent applies local quality by making the light transmittance of the mask non-uniform: the first region (corresponding to boundary areas) has lower light transmittance while the second region (corresponding to main body areas) has higher light transmittance. This creates different exposure conditions in different locations, resulting in color resistances with thinner boundaries and reduced horn formation, thereby eliminating dark lines while maintaining the overlapping structure for reliability.
2Ease of manufacture
If ordinary transparent mask is used for exposure, then manufacturing simplicity is maintained, but non-parallel light forms slopes at color resistance boundaries creating horns
Solution Approach 1:
The mask is designed with different light transmittance in different regions: the first region with lower transmittance and the second region with higher transmittance. This local differentiation corrects the slope at boundaries caused by non-parallel light, producing color resistances with flatter boundaries and reduced horns, thereby improving manufacturing precision while maintaining reasonable ease of manufacture.
Solution Approach 2:
The patent changes the light transmittance parameter of the mask from uniform (ordinary mask) to non-uniform (first region with lower transmittance, second region with higher transmittance). This parameter change compensates for the non-parallel light effect, reducing boundary slopes and horn formation, thus improving the precision of color resistance boundaries.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach eliminates or reduces horns at overlapped boundaries, maintaining normal line width/line space and preventing chaotic liquid crystal orientations, thereby enhancing light transmittance and reducing dark pixel lines.
Implementation Method 1
coating a photoresist material on the substrate to form a color resistance unit thereof; exposing the color resistance unit
Data Source
AI summary
The present invention discloses a method for manufacturing a color filter, a color filter, and a liquid crystal panel. The method comprises: providing a substrate; and forming a plurality of color resistances on the substrate one by one using a color resistance forming process, with boundaries of adjacent color resistances being overlapped with each other. The color resistance forming process comprises: coating a photoresist material on the substrate to form a color resistance unit thereof; exposing the color resistance unit, with a light intensity received at the boundary of the color resistance unit being smaller than that received by the main body of the color resistance unit. Through the present invention, dark pixel lines at the boundary overlaps can be eliminated, and transmittance of the product can be enhanced.