Color Filter Substrate Buffer Pattern for Rubbing Roller Protection
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Solution Overview
Problem
The conventional method of fabricating color filter substrates often results in damage to the rubbing roller during the alignment rubbing process, leading to defects in the alignment material layer and poor liquid crystal molecule alignment, which affects the display quality of LCD panels.
Innovation Solution
A method and design for a color filter substrate that includes a buffer pattern in the peripheral region, which reduces the height fall and prevents damage to the rubbing roller, featuring a buffer pattern with a gradual density reduction and increased height compared to the shielding pattern layer, allowing the alignment rubbing process to start from a safer position.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the alignment rubbing process starts from the side edge of the shielding frame in the peripheral region, then the alignment material layer can be processed, but the rubbing roller is easily damaged due to the height change at the edge
Solution Approach 1:
The patent introduces a buffer region with a buffer pattern layer before the alignment rubbing process. This buffer region serves as a preliminary preparation area where the rubbing roller can start rubbing without directly contacting the height change at the shielding frame edge, thus preventing roller damage while still enabling the alignment process to proceed
Solution Approach 2:
The buffer pattern layer acts as an intermediary between the rubbing roller and the alignment material layer. By placing this intermediate layer in the buffer region, the rubbing roller can perform its function on the alignment material layer without directly encountering the harmful height change at the shielding frame boundary
2Productivity
If the rubbing roller contacts the shielding frame edge directly, then the alignment rubbing can be performed, but the alignment material layer is damaged causing poor liquid crystal alignment
Solution Approach 1:
The buffer region with buffer pattern layer is prepared in advance before the alignment rubbing process. This preliminary structure allows the rubbing roller to start from a safe position and gradually transition onto the alignment material layer, preventing direct contact with the shielding frame edge and avoiding damage to the alignment material layer
Solution Approach 2:
The buffer pattern layer serves as a mediator that protects the alignment material layer from damage. By introducing this intermediate buffer region, the rubbing roller can perform alignment rubbing on the alignment material layer without the harmful direct contact with the shielding frame edge that would cause grooves and defects
Data Source
AI summary
A method of fabricating a color filter substrate is provided. First, a transparent substrate having a display region, a peripheral region and a buffer region is provided. Next, a shielding pattern layer is formed in the peripheral region of the transparent substrate, and a color filter layer is formed in the display region of the transparent substrate. Further, at least one buffer pattern is formed in the buffer region.