Color Filter Photoresist Curing to Block Dye Diffusion
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Solution Overview
Problem
The issue of photoresists of different colors in a color filter dyeing with each other, leading to a decrease in transmittance due to dye molecules diffusing and penetrating the surface of the first photoresist after the formation of the second photoresist.
Innovation Solution
Control the curing process parameters of the first photoresist to increase its density, preventing dye molecules from entering, by adjusting exposure energy, heat-curing temperature, and time, and forming a dense filter layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a second photoresist comprising dye molecules is formed after the first photoresist is cured, then the color gamut and low power consumption are achieved, but the dye molecules diffuse and penetrate the surface of the first photoresist, reducing its transmittance
Solution Approach 1:
The patent applies preliminary anti-action by forming a protective layer (such as a barrier layer or additional photoresist layer) on the surface of the first photoresist before forming the second photoresist. This protective layer prevents dye molecules from diffusing into the first photoresist, thereby counteracting the harmful effect in advance while still allowing the second photoresist to provide color filtering functionality
Solution Approach 2:
The patent uses an intermediary substance (such as a barrier layer made of inorganic material or a specific photoresist composition) that is placed between the first photoresist and the second photoresist. This intermediary layer acts as a mediator that blocks dye molecule diffusion while allowing the optical and functional requirements of both photoresist layers to be met
2Productivity
If the first photoresist is cured with standard parameters, then the fabrication process is efficient, but the photoresist density is insufficient, allowing dye molecules to penetrate and reduce transmittance
Solution Approach 1:
The patent applies parameter changes by modifying the curing parameters of the first photoresist, such as increasing the curing temperature, extending the curing time, or adjusting the UV exposure energy. These parameter changes increase the cross-linking density and molecular packing of the photoresist, making it more resistant to dye molecule penetration while maintaining fabrication efficiency through optimized process parameters
3Object-affected harmful factors
If the exposure energy value, heat-curing temperature, and time are increased to increase photoresist density, then dye molecule penetration is prevented, but the fabrication process becomes more complex and time-consuming
Solution Approach 1:
The patent uses composite materials by combining the first photoresist with a barrier layer made of different material composition (such as inorganic oxide layers, organic barrier coatings, or specially formulated photoresist compositions). This composite structure provides enhanced resistance to dye molecule penetration without requiring excessive curing parameters, as the barrier layer itself provides the protective function
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents dye molecules from diffusing into the first photoresist, maintaining its transmittance and avoiding a decrease in product quality.
Implementation Method 1
photo-curing the first photoresist material layer from a side of the first mask away from the substrate
Implementation Method 2
heat-curing the developed first photoresist material layer to form the first photoresists
Data Source
AI summary
A method for fabricating a color filter includes: providing a substrate; forming a first photoresist material layer on the substrate; patterning the first photoresist material layer to form a plurality of first photoresists; forming a second photoresist material layer on the first photoresists and the substrate, wherein the second photoresist material layer comprises a plurality of dye molecules; and patterning the second photoresist material layer to form a plurality of second photoresists. The patterning the first photoresist material layer to form the first photoresists includes: controlling curing process parameters of the first photoresists to increase a density of the first photoresists, thereby preventing the dye molecules from entering the first photoresists.