Color Filter Grid Overlap for Super PD Pixel AF Performance

The patent applies local quality by forming a super PD microlens with a different height than standard microlenses. Specifically, the super PD microlens has a greater height than standard microlenses, creating a localized optical structure that compensates for the overall reduction in optical height caused by smaller pixel dimensions. This localized structural differentiation maintains the necessary optical path length for phase difference detection in super PD pixels while allowing surrounding pixels to be miniaturized.

The patent changes the height parameter of the microlens structure to resolve the contradiction. By adjusting the super PD microlens height to be greater than standard microlenses, the patent compensates for the reduced optical path length in miniaturized pixels. This parameter modification allows the system to maintain adequate optical performance for phase difference detection despite the overall reduction in pixel and optical structure dimensions.

The patent merges the formation of super PD microlenses and standard microlenses into a single fabrication process using one mask. Instead of using separate masks for different microlens types, the patent designs a unified mask structure that patterns both super PD microlenses (with greater height) and standard microlenses (with standard height) simultaneously. This consolidation simplifies the fabrication process while maintaining the differentiated microlens heights necessary for proper AF performance.

The patent creates a universal mask that serves multiple functions: it patterns both super PD microlenses and standard microlenses in a single step. This multi-functional mask eliminates the need for separate patterning processes for different microlens types, thereby simplifying manufacturing while maintaining the ability to create the required height differentiation between super PD and standard microlenses through single-step thickness control.