Color Filter Layer Light-Scattering Surface Formation
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Solution Overview
Problem
Conventional transflective LCD panels face challenges with reduced aperture ratio due to misalignment of color filters and increased manufacturing costs from complex patterning processes for creating a rough surface for light-scattering effects.
Innovation Solution
A method involving a single exposure-and-development process to pattern a color filter layer with surface cure initiators of low photosensitivity, followed by post-baking to achieve a rough surface with a surface roughness index of 0.5 to 2.0 μm, providing light-scattering effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If color filters are disposed on the upper substrate, then the color filters can be formed separately, but the alignment with pixel regions deteriorates causing reduced aperture ratio
Solution Approach 1:
The patent merges the color filter formation process with the pixel electrode formation process by forming both on the same lower substrate. This integration ensures that the color filters and pixel electrodes are automatically aligned, eliminating the aperture ratio reduction caused by misalignment while maintaining the benefit of unified process control.
2Illumination intensity
If a bump structure with rough surface is formed to provide light-scattering effect, then light-scattering performance is improved, but at least two patterning steps are required increasing manufacturing cost
Solution Approach 1:
The patent combines the light-scattering structure formation with the pixel electrode formation into a single patterning process. The same photolithography steps used to define the pixel electrodes also define the light-scattering bumps, eliminating the need for separate patterning steps while maintaining effective light-scattering performance.
Solution Approach 2:
The patent creates a multi-functional structure where the pixel electrode pattern serves dual purposes: defining the electrical boundary of the pixel electrode and simultaneously defining the light-scattering bump structure. This universal patterning approach reduces process complexity while achieving multiple functional requirements.
3Illumination intensity
If a bump structure is formed to create rough surface for light-scattering, then light-scattering effect is improved, but manufacturing cost is increased due to additional patterning step
Solution Approach 1:
The patent merges the light-scattering structure formation with the pixel electrode formation into a single patterning process. The same photolithography steps used to define the pixel electrodes also define the light-scattering bumps, eliminating the need for separate patterning steps while maintaining effective light-scattering performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces manufacturing costs and enhances light-scattering performance while maintaining color-filtering capabilities, applicable to various display panels.
Implementation Method 1
the color filter layer is post-baked to render the color filter layer a rough surface to provide the light-scattering effect
Implementation Method 2
The color filter layer includes surface cure initiators having a low photosensitivity
Data Source
AI summary
A method of forming a color filter layer having a light-scattering effect. First, substrate is provided, and a color filter layer is coated on the substrate. Then, an exposure-and-development process is performed to pattern the color filter layer. Subsequently, the color filter layer is post-baked to render the color filter layer a rough surface to provide the light-scattering effect, wherein the color filter layer has a surface roughness index Rz in the range of 0.5 to 2.0 μm.