Color Filter Substrate Recesses for Transflective Display Color Coordination
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Solution Overview
Problem
Transflective LCDs face challenges in achieving color coordination between transmissive and reflective regions due to differences in color filter layer thickness, leading to inconsistent image display, and existing methods either require multiple masks, increase fabrication costs, or result in thick planarizing protective layers and material wastage.
Innovation Solution
A fabricating method for the color filter substrate that forms recesses on the substrate to adjust the thickness of the color filter layer, allowing for uniform color coordination by varying the depth of these recesses, thereby reducing the number of processes and thickness of the planarizing protective layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the thickness of color filter layer is adjusted to achieve color coordination between transmissive and reflective regions, then color consistency is improved, but the planarizing protective layer thickness must be increased to compensate for surface unevenness
Solution Approach 1:
The patent applies local quality by forming recesses at specific locations (transmissive regions) rather than uniformly across the entire substrate. This allows the color filter layer to have different effective thicknesses in different regions - thicker in transmissive regions (where recesses are formed) and thinner in reflective regions - achieving color coordination without requiring overall thickness increase of the planarizing protective layer
Solution Approach 2:
The recesses are formed in advance before depositing the color filter layer and planarizing protective layer. This preliminary action creates the necessary surface topology that allows subsequent layers to self-adjust to the required thickness distribution, eliminating the need for thick planarizing protective layers to compensate for surface unevenness
2Manufacturing precision
If conventional methods are used to adjust color filter layer thickness for color coordination, then color consistency is improved, but the number of fabrication processes and masks must be increased
Solution Approach 1:
The patent merges the formation of recesses with the existing black matrix formation process by using the same photoresist coating, exposure, and development steps. Instead of adding separate processes for creating thickness variations, the invention combines multiple functions (black matrix formation and recess formation) into a single integrated process flow, reducing the total number of fabrication steps and masks required
Data Source
AI summary
A fabricating method of color filter substrate includes a step of forming a black matrix pattern and a color filter layer pattern on a substrate. The black matrix pattern partitions a plurality of sub-pixel regions on the substrate, the color filter layer covers over the plurality of sub-pixel regions, the sub-pixel region includes a transmissive region and/or a reflective region. Before forming the color filter layer pattern the fabricating method further comprises a step of forming a plurality of recesses on the substrate. Each transmissive region in the sub-pixel regions corresponds to a respective recess in terms of location. Correspondingly, the invention provides a color filter substrate fabricated by such fabricating method, as well as a display device comprising such color filter substrate. The fabricating method as provided by the present invention can achieve an effect of color coordination and reduce the number of processes and the thickness of the planarizing protective layer.