Color Filter with Segmented Single and Multilayer Units

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Solution Overview

Problem

Conventional color filters face challenges in manufacturing efficiency and effectiveness, with single-layer filters wasting photoresist material and composite filters having low etching rates, making mass production difficult.

Innovation Solution

A color filter design incorporating both single-layer and multilayer filter units on a substrate, using materials like silicon dioxide, titanium oxide, and nitrogen pentoxide, with a manufacturing method involving thin film deposition and spin coating to simplify steps and improve production capacity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If spin coating process is used to form color photoresist film, then photoresist can be evenly coated on substrate, but most of the color photoresist is wasted during the process

Engineering Contradiction:
Improveeven coating qualityVSAvoidphotoresist waste
Core Design Contradiction:
Manufacturing precisionVSLoss of substance

Solution Approach 1:

The invention divides the filter array into multiple regions, with different filter units (single-layer or multilayer) arranged in specific patterns. This segmentation allows selective formation of filters in different regions, reducing unnecessary material application and waste while maintaining coating quality where needed.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If sputter etch process is performed to pattern film layers in composite filters, then filtering effect is improved, but etching rate is very low making mass production difficult

Engineering Contradiction:
Improvefiltering effectVSAvoidetching rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The invention changes the material parameters of the filter layers, using photosensitive materials that can be patterned through photolithography rather than sputter etching. This parameter change enables much higher etching/patterning rates suitable for mass production while maintaining good filtering effects through the optical properties of the materials.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention replaces the mechanical sputter etching process with a photochemical patterning process using photolithography. This substitution eliminates the slow mechanical removal of material and replaces it with a faster photochemical reaction that achieves the same patterning function at much higher speeds suitable for mass production.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If filter layers of different colors are fabricated on the same substrate using composite film layer structures, then filtering effect is improved, but manufacturing complexity increases

Engineering Contradiction:
Improvefiltering effectVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention uses a universal photosensitive material system that can form different colored filters through selective photolithography processes. Instead of requiring different material deposition processes for different colors, the same photosensitive material platform is used across all filter units, simplifying the manufacturing process while maintaining the ability to produce various colors with good filtering effects.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design achieves a better filtering effect and simplifies manufacturing, increasing production capacity while avoiding the inefficiencies of single-layer and composite filter production methods.

Implementation Method 1

each of the multilayer filter units includes at least one low refraction layer and at least one high refraction layer

Methodology Applied
Scientific EffectRefraction: Refraction

Implementation Method 2

the filter having the composite film layer structures is formed by stacking film layers with different refractive indexes in interlace, so as to filter specific wavelengths

Methodology Applied
Scientific EffectInterference: Interference

Implementation Method 3

a material of the first single-layer filter unit includes a photosensitive material

Methodology Applied
Scientific EffectPhotochemical reaction: Photo-oxidation

Data Source

PatentUS8492056B2Color filter and manufacturing method thereof
Publication Date: 2013.07.23 HIMAX DISPLAY INC
  • US8492056B2 patent drawing
  • US8492056B2 patent drawing
  • US8492056B2 patent drawing

AI summary

A color filter including a substrate, a plurality of first single-layer filter units and a plurality of first multilayer filter units is provided. The substrate has a plurality of first regions and a plurality of second regions. The first single-layer filter units is disposed on the substrate and located in the first regions respectively. The first multilayer filter units is disposed on the substrate and located in the second regions respectively. A manufacturing method for a color filter is also provided.