Color Filter Manufacturing via Integrated Spacer Patterning
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Solution Overview
Problem
Conventional color filter manufacturing processes in liquid crystal display technology require repetitive photolithography steps, leading to high process costs and extended cycle times due to the need for separate processes for the black matrix layer and photo spacers.
Innovation Solution
A method involving multiple material layers and photolithography steps using a specific mask to pattern photoresists and filter portions with integrated spacer portions, eliminating the need for additional photolithography processes for the black matrix and spacers by using the same material layers for light-shielding and spacer formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate photolithography processes are used for black matrix layer and photo spacers, then manufacturing precision is improved, but manufacturing cycle time increases and process cost rises
Solution Approach 1:
The patent combines the formation of black matrix layer and photo spacers into a single photolithography process. The mask pattern simultaneously defines both the black matrix regions and the photo spacer regions, eliminating the need for separate photolithography steps. This merging reduces manufacturing cycle time while maintaining precision through a unified patterning approach.
Solution Approach 2:
The photolithography mask serves multiple functions simultaneously: it patterns the black matrix layer, forms the photo spacer structures, and defines the color filter regions. This multi-functional mask eliminates the need for separate specialized masks for each component, thereby reducing process steps and time while preserving manufacturing precision.
2Manufacturing precision
If multiple separate photolithography processes are used for different layers, then manufacturing precision is improved, but material waste increases and process cost rises
Solution Approach 1:
By merging the patterning of black matrix layer and photo spacers into one photolithography process, the patent reduces the number of times material is applied and removed. This eliminates redundant material cycles and reduces overall material waste while maintaining the precision required for multiple layer formation.
Solution Approach 2:
The mask is designed in advance to simultaneously define all required patterns for black matrix, photo spacers, and color filters. This preliminary planning of the mask pattern avoids subsequent rework and material reapplication, reducing material waste while ensuring precise formation of all components in a single process.
3Reliability
If separate photolithography processes are used for black matrix and photo spacers, then process control is improved, but productivity decreases
Solution Approach 1:
The patent merges two separate photolithography processes into one unified process, directly doubling the productivity gain. By patterning black matrix layer and photo spacers simultaneously in a single exposure step, the manufacturing throughput increases while process control is maintained through a comprehensive mask design that addresses all patterning requirements in one controlled operation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces material waste, lowers production costs, and shortens the manufacturing cycle by integrating spacer and filter formation within the existing photolithography steps, enhancing production efficiency.
Implementation Method 1
performing photolithography to the first material layer through a specific mask so as to pattern the first material layer to have multiple first photoresists and multiple first filter portions
Data Source
AI summary
The present invention provides a color filter and a manufacturing method thereof. The method includes steps of: coating a first material layer on a substrate and patterning it to have first photoresists, first filter portions and first spacer portions; coating a second material layer on the substrate and patterning it to have second photoresists, second filter portions and second spacer portions; and coating a third material layer on the substrate and patterning it to have third photoresists, third filter portions and third spacer portions; and the first, the second, the third filter portions are correspondingly overlapped with each other, and the first, the second, the third spacer portions are correspondingly overlapped with each other.