Color Filter Substrate Spacer Formation via Segmented Exposure
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The high manufacturing cost of color filter substrates and liquid crystal panels due to complex and expensive Multi Tone Mask (MTM) technology used for forming black matrices and spacers in prior art.
Innovation Solution
A method involving coating photoresist materials on substrates to form monochromatic and color blocks, with one-time exposure to create black matrices and spacers, using ordinary masks to simplify the process and reduce costs, where different-sized color blocks form main and auxiliary spacers with varying heights.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If Multi Tone Mask (MTM) technology is used to form black matrices and spacers in one process, then the manufacturing process is simplified, but the manufacturing cost increases due to complex and expensive masks
Solution Approach 1:
The patent segments the exposure process into two distinct stages: first exposing the photoresist material through a simple mask to form monochromatic blocks and color blocks, then selectively exposing the black photoresist material in the light blocking region to form the black matrix and spacers. This segmentation allows each exposure step to use a simpler mask rather than requiring a complex MTM mask for all features simultaneously.
Solution Approach 2:
The patent performs preliminary actions by first forming the monochromatic blocks and color blocks in the light blocking region before forming the black matrix and spacers. The color blocks serve as preliminary structures that define where spacers will later be formed, allowing the black photoresist material to be selectively exposed only in specific areas to create the final black matrix and spacer structures.
2Productivity
If Multi Tone Mask (MTM) technology is used to form black matrices and spacers, then the black matrix process and spacer process are combined into one process, but the manufacturing cost increases
Solution Approach 1:
The patent segments the formation of black matrix and spacers into sequential exposure steps rather than attempting to form both simultaneously with a complex MTM mask. The first exposure forms color blocks that serve as templates, and the second selective exposure forms the black matrix and spacers, achieving process integration without requiring expensive multi-tone masks.
Solution Approach 2:
The color blocks act as intermediary structures that mediate between the initial photoresist pattern and the final black matrix/spacer structures. By using the color blocks as intermediate templates, the patent enables selective formation of black matrix and spacers through a second exposure step, avoiding the need for complex MTM technology while maintaining process integration.
3Device complexity
If ordinary masks are used for one-time exposure to form black matrices and spacers, then the manufacturing cost decreases, but the process requires precise control of exposure conditions
Solution Approach 1:
The patent segments the exposure process into two distinct steps with different exposure conditions: the first exposure uses conditions optimized for forming monochromatic blocks and color blocks, while the second selective exposure uses conditions optimized for forming the black matrix and spacers. This segmentation allows each exposure step to be independently optimized and controlled, reducing the overall precision requirements compared to a single complex exposure step.
Solution Approach 2:
The preliminary formation of color blocks in the first exposure step creates a structured template that guides the second exposure step. This preliminary action establishes a foundation that makes the subsequent selective exposure easier to control with precise exposure conditions, as the color blocks already define the spatial locations where spacers need to be formed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces manufacturing complexity and costs by using ordinary masks for one-time exposure, forming spacers and black matrices efficiently, thereby lowering the overall production costs of color filter substrates and liquid crystal panels.
Implementation Method 1
coating a photoresist material on the first substrate, and exposing the pixel unit regions to form monochromatic blocks, and partially exposing the light blocking region to form color blocks
Implementation Method 2
exposing the black photoresist material and the black photoresist material located in the light blocking region forming a black matrix and the black photoresist material covering the color blocks forming spacers
Data Source
AI summary
Disclosed is a manufacturing method of a color filter substrate, comprising: providing a first substrate, and the first substrate comprising pixel unit regions and a light blocking region located between the pixel unit regions, coating a photoresist material on the first substrate, and exposing the pixel unit regions to form monochromatic blocks, and partially exposing the light blocking region to form color blocks; coating a black photoresist material in the light blocking region, and the black photoresist material covering the color blocks; exposing the black photoresist material and the black photoresist material located in the light blocking region forming a black matrix and the black photoresist material covering the color blocks forming spacers. The black photoresist material, of which the color blocks are used to be the substrate, form spacers, and the black photoresist material in the rest part of the light blocking region forms a black matrix.