Color Filter Substrate Single Mask Integration

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Solution Overview

Problem

The conventional manufacturing process of color filter substrates requires a six-mask process, which is time-consuming and costly, necessitating a reduction in the number of masks to lower production time and costs.

Innovation Solution

A method involving a substrate with color filter patterns, a black matrix, spacers, and protrusions made of the same material, where the black matrix, spacers, and protrusions are formed using a single mask, and a common electrode covers these elements, reducing the number of masks needed and simplifying the process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a six-mask process is used to manufacture color filter substrate, then the manufacturing precision and reliability are maintained, but the manufacturing time and cost increase significantly

Engineering Contradiction:
Improvecolor filter substrate qualityVSAvoidmanufacturing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent merges the formation of black matrix, spacers, and protrusions into a single photolithography step using one mask layer. This combines three separate mask processes into one, reducing the total number of masks from six to four while maintaining the functional integrity of each component through selective etching and material deposition steps.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent segments the single mask layer into different functional regions: a first mask pattern for black matrix formation, a second mask pattern for spacer formation, and a third mask pattern for protrusion formation. This segmentation allows each component to be formed with appropriate precision while using a unified mask structure, reducing overall process complexity.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If a six-mask process is used to manufacture color filter substrate, then the manufacturing precision and reliability are maintained, but the manufacturing cost increases

Engineering Contradiction:
Improvecolor filter substrate qualityVSAvoidmanufacturing cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent merges the formation of black matrix, spacers, and protrusions into a single photolithography step using one mask layer. This combines three separate mask processes into one, reducing the total number of masks from six to four while maintaining the functional integrity of each component through selective etching and material deposition steps.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The single mask layer serves multiple functions simultaneously: defining black matrix regions, spacer positions, and protrusion locations. This multi-functional mask design eliminates the need for separate masks for each component, reducing material costs and simplifying the manufacturing process while maintaining precision.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Productivity

If fewer masks are used in the manufacturing process, then the manufacturing time and cost are reduced, but the process complexity increases

Engineering Contradiction:
Improvemanufacturing efficiencyVSAvoidprocess complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent segments the single mask layer into different functional regions: a first mask pattern for black matrix formation, a second mask pattern for spacer formation, and a third mask pattern for protrusion formation. This segmentation allows each component to be formed with appropriate precision while using a unified mask structure, reducing overall process complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary patterning of the mask layer to define all future component locations before any etching or deposition occurs. This preliminary action establishes a comprehensive template that guides subsequent processing steps, ensuring that reduced mask count does not compromise process control or precision.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS7826010B2Color filter substrate and method of manufacturing the same
Publication Date: 2010.11.02 AU OPTRONICS CORP
  • US7826010B2 patent drawing
  • US7826010B2 patent drawing
  • US7826010B2 patent drawing

AI summary

A color filter substrate including a substrate, a number of color filter patterns, a black matrix, a number of spacers, a number of protrusions, and a common electrode is provided. The substrate has a number of sub-pixel regions. The color filter patterns are disposed on the substrate, and each color filter is disposed within one of the sub-pixel regions. The common electrode covers the color filter patterns and the substrate. The black matrix is disposed on the common electrode and between the sub-pixel regions. The spacers are disposed on the black matrix and connected to the black matrix. The protrusions are disposed on the common electrode above the color filter patterns. The black matrix, the spacers, and the protrusions are made of the same material. As mentioned above, a color filter substrate manufactured with low cost is provided.