Color Measurement Shutter With Exposed Reflection Reference Surface

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Solution Overview

Problem

Existing color measurement apparatuses face issues with dust entry through open openings and maintenance of the reflection reference surface, leading to inaccurate reflection reference values due to contamination.

Innovation Solution

A color measurement apparatus with a shutter unit that switches between closed, open, and exposed states, featuring a reflection reference surface outside the apparatus for easy maintenance and a configuration that suppresses dust entry.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the opening portion remains open to allow light entry for color measurement, then measurement function is enabled, but dust enters inside the apparatus causing contamination

Engineering Contradiction:
Improvemeasurement capabilityVSAvoiddust contamination
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The shutter unit is configured to automatically cover the opening portion before measurement is completed and expose it before measurement begins. This preliminary action of closing the shutter after measurement prevents dust from entering the apparatus interior, while the preliminary exposure before measurement ensures light can enter for accurate color measurement.

Inventive Principle:
Principle #10Preliminary action

2Object-affected harmful factors

If the reflection reference surface is disposed inside the apparatus on the support plate, then it is protected from external contamination, but it becomes difficult to maintain and clean when stained

Engineering Contradiction:
Improveprotection from contaminationVSAvoidmaintainability of reflection reference surface
Core Design Contradiction:
Object-affected harmful factorsVSEase of repair

Solution Approach 1:

The shutter unit is configured to be movable between different positions: inside the apparatus for protection and outside for maintenance. This dynamic repositioning allows the reflection reference surface to be protected during operation while being easily accessible for cleaning and maintenance when needed, resolving the contradiction between protection and maintainability.

Inventive Principle:
Principle #15Dynamics

3Measurement precision

If a support plate with reflection reference surface is used to cover the opening portion, then reflection reference values can be acquired, but the apparatus complexity increases and maintenance becomes difficult

Engineering Contradiction:
Improvereflection reference value acquisitionVSAvoidapparatus structure complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The shutter unit serves multiple functions: it acts as a shutter to control light entry, provides a reflection reference surface for calibration, and serves as a protective cover when closed. By combining these functions into a single multi-functional component, the apparatus complexity is minimized while maintaining measurement precision and ease of maintenance.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS12372407B2Color measurement apparatus
Publication Date: 2025.07.29 SEIKO EPSON CORP
  • US12372407B2 patent drawing
  • US12372407B2 patent drawing
  • US12372407B2 patent drawing

AI summary

A color measurement apparatus includes an opening portion that is formed in an opening portion forming member arranged in a bottom portion of the apparatus and causes light arriving from a measurement target to enter inside the apparatus, a light emission portion that emits light for measurement toward the measurement target, and a shutter unit that is configured to switch between a closed state in which the opening portion is covered, and an open state in which the opening portion is open, and that has a reflection reference surface at a position facing the opening portion in the closed state as a reference of reflectance, in which the shutter unit is disposed such that the shutter unit is configured to switch to, in addition to the closed state and the open state, an exposed state in which the reflection reference surface is exposed outside the apparatus.