Color Pattern Assignment in Semiconductor Multi-Patterning
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Solution Overview
Problem
In multi-patterning technology for semiconductor fabrication, conflicts arise when patterns assigned to different masks are closer than the minimum separation distance, leading to design rule violations, which existing methods struggle to resolve efficiently without reassigning patterns or altering the layout.
Innovation Solution
A system and method that utilize a conflict graph to assign color patterns to patterns in a layout, adjusting vertices and generating a second conflict graph to determine appropriate color pattern assignments for masks, allowing for efficient detection and resolution of conflicts through photolithographic processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple masks are used for patterning a layer, then smaller separations between patterns can be achieved, but conflicts arise when patterns assigned to different masks are closer than the minimum separation distance
Solution Approach 1:
The patent segments the patterning process into multiple discrete masks (first mask, second mask, third mask, etc.), each responsible for specific patterns. The layout is divided and assigned to different masks systematically, allowing patterns closer than the minimum separation distance to be formed by different masks while maintaining design rule compliance within each mask.
Solution Approach 2:
The patent introduces a new dimension of mask assignment by assigning patterns to different masks based on their spatial relationships and separation distances. This multi-dimensional assignment strategy (beyond simple geometric grouping) enables resolution of conflicts by distributing patterns across multiple mask layers, effectively adding a mask-dimension to the patterning problem solution.
2Reliability
If existing methods are used to resolve conflicts, then design rule violations can be detected, but pattern reassignment or layout alteration is required which reduces efficiency
Solution Approach 1:
The patent performs preliminary conflict detection and mask assignment before the actual patterning process. By systematically analyzing the layout, identifying potential conflicts, and pre-assigning patterns to appropriate masks based on separation distances, the method resolves all design rule violations in advance, eliminating the need for iterative reassignment or layout modification during manufacturing.
Solution Approach 2:
The patent changes the assignment parameter from simple geometric grouping to a comprehensive mask assignment parameter that considers separation distances, pattern types, and mask capacities. This parameter transformation enables automatic conflict resolution by optimizing the distribution of patterns across multiple masks, maintaining design rule compliance while improving patterning efficiency.
Data Source
AI summary
A method includes operations below. A layout of a circuit is converted to a first conflict graph. A first vertex and a second vertex in the first conflict graph are adjusted based on first data indicating a color patterns assignment for the circuit, in order to generate a second conflict graph, in which the first vertex indicates a first pattern in the layout, and the second vertex indicates a second pattern in the layout. According to the second conflict graph, a first color pattern is assigned to both of the first pattern and the second pattern, or the first color pattern is assigned to the first pattern and a second color pattern is assigned to the second pattern, in order to generate second data for fabricating the circuit.