Radiation-Sensitive Colored Composition Halogen Ion Control
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Solution Overview
Problem
The challenge is to develop a radiation-sensitive colored composition that minimizes device contamination and residue generation during the formation of patterned colored films, particularly when using synthetic dyes, while maintaining high-definition pattern shapes and ensuring the color filter's performance in solid-state imaging devices and liquid crystal display apparatuses.
Innovation Solution
A radiation-sensitive colored composition containing a dye with controlled halogen ion content (10 ppm to 1000 ppm), a polymerizable compound, and a solvent, which includes a colorant multimer with ethylenically unsaturated bonds, and optionally a pigment and alkali-soluble resin, is used. This composition is applied, exposed, and developed to form a patterned colored film, with the halogen ions potentially influencing the film's properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If synthetic dyes containing halogen ions are used for color filters, then the dyes exhibit good fastness properties and stability, but device contamination occurs due to halogen ion release
Solution Approach 1:
The patent applies parameter changes by precisely controlling the halogen ion content in synthetic dyes to within 10 ppm to 1000 ppm. This quantitative parameter control allows the dye to maintain sufficient fastness properties while minimizing halogen ion release that causes device contamination, thereby resolving the contradiction between reliability and harmful effects.
2Reliability
If pigment dispersion method is used for color filter manufacturing, then stability against light and heat is achieved, but light scattering and color unevenness occur due to particulate nature
Solution Approach 1:
The patent extracts the problematic particulate nature of pigments by transitioning to a dye-based system where the coloring material is dissolved in the resist. This extraction of the solid particle form eliminates light scattering and color unevenness while preserving stability through the use of synthetic dyes with controlled halogen content, achieving both reliability and manufacturing precision.
3Manufacturing precision
If pigment particles are refined into smaller particles, then light scattering and coarseness are reduced, but dispersion stability becomes difficult to achieve
Solution Approach 1:
The patent extracts the fundamental limitation of particle refinement by eliminating the particulate form entirely in favor of dissolved dye molecules. This approach avoids the trade-off between reduced particle size and maintained dispersion stability, as the dye is molecularly dispersed in the resist rather than existing as particles that would require careful size control and stabilization.
4Object-affected harmful factors
If halogen-free raw materials are used for dye synthesis, then device contamination is reduced, but the difficulty of synthesis increases
Solution Approach 1:
The patent applies parameter changes by establishing an optimal range for halogen ion content (10 ppm to 1000 ppm) rather than eliminating halogens entirely. This parameter-based approach maintains synthesis ease by allowing the use of conventional halogen-containing raw materials while controlling the final halogen content to acceptable levels, balancing manufacturing ease with contamination reduction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively reduces device contamination and residue formation, enabling the creation of high-definition patterned films suitable for color filters in solid-state imaging devices and liquid crystal displays, while allowing for controlled halogen ion levels to optimize film properties.
Implementation Method 1
a radiation-sensitive colored composition containing (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion, (B) a polymerizable compound, and (C) a solvent
Implementation Method 2
colorants are needed, which have preferable optical absorption characteristics in view of color reproducibility
Data Source
AI summary
The object of the present invention is to provide a radiation-sensitive colored composition which can suppress the generation of the contamination of the device. A radiation-sensitive colored composition includes: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.