Column Decoder Layout with Stacked Transistors and Guard Rings

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Solution Overview

Problem

The miniaturization trend of semiconductor devices requires an optimized layout of semiconductor structures to enhance performance, but existing layouts face challenges in reducing size and minimizing latch-up effects while maintaining adequate transistor spacing and isolation.

Innovation Solution

The proposed layout includes a column decoder with specific transistor regions and guard rings arranged in a particular configuration to reduce vertical height and size, with transistors stacked and adjacent to each other, and guard rings strategically placed to enhance isolation and reduce latch-up effects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If transistor regions are arranged in a compact stacked configuration to reduce device size, then area is reduced, but latch-up effects increase due to reduced spacing between P-type and N-type regions

Engineering Contradiction:
Improvedevice areaVSAvoidlatch-up effects
Core Design Contradiction:
Area of stationary objectVSObject-affected harmful factors

Solution Approach 1:

Guard rings are introduced as intermediary structures between P-type and N-type transistor regions. These guard rings act as protective barriers that prevent direct interaction between opposite polarity regions, thereby eliminating latch-up effects while allowing the transistor regions to maintain their compact stacked configuration for reduced area.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The layout transitions from a planar arrangement to a three-dimensional stacked configuration where P-type and N-type transistor regions are arranged vertically above each other rather than horizontally adjacent. This vertical stacking reduces the horizontal footprint and device area while maintaining adequate electrical isolation through the guard ring structures positioned at strategic vertical levels.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If guard rings are added to reduce latch-up effects, then reliability is improved, but device complexity increases

Engineering Contradiction:
Improvedevice reliabilityVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The guard ring structures are segmented and positioned only at specific critical locations where P-type and N-type regions interface, rather than forming continuous rings around entire devices. This selective placement provides necessary protection against latch-up while minimizing the total amount of additional structure and reducing overall device complexity.

Inventive Principle:
Principle #1Segmentation

3Area of stationary object

If transistor regions are placed closer together to reduce area, then area is reduced, but isolation between regions deteriorates

Engineering Contradiction:
Improvedevice areaVSAvoidregion isolation
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

Guard rings serve as intermediary isolation structures that are strategically positioned between closely spaced P-type and N-type transistor regions. These guard rings provide electrical isolation and prevent harmful interactions between adjacent regions, enabling the design to achieve compact area while maintaining adequate isolation through the mediating guard ring structures.

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS12040021B2Layout of semiconductor structure comprising column decoder
Publication Date: 2024.07.16 CHANGXIN MEMORY TECH INC
  • US12040021B2 patent drawing
  • US12040021B2 patent drawing
  • US12040021B2 patent drawing

AI summary

Embodiments of the present disclosure include a layout of a semiconductor structure, including: a column decoder, wherein the column decoder includes a first P-type transistor region, a second P-type transistor region, a first N-type transistor region, a second N-type transistor region, and a NAND gate region. The first P-type transistor region is located above the first N-type transistor region, the second P-type transistor region is located above the first P-type transistor region, and the second N-type transistor region is located above the second P-type transistor region; the NAND gate region is adjacent to the first P-type transistor region, the second P-type transistor region, and the first N-type transistor region.