Combinatorial Deposition Tool with Rotatable Substrate Holder
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Solution Overview
Problem
Current methods for depositing combinatorial samples, such as ternary and quaternary alloys, are labor-intensive and limited in scalability, requiring complex masks and multiple targets, which restricts the range of composition variation and increases processing time, making it difficult to achieve continuous and homogeneous composition gradients over large areas.
Innovation Solution
A system and method for combinatorial deposition using a rotatable positioning system that allows substrates to be positioned in parallel and non-parallel configurations relative to multiple deposition sources, with a mask holder system for varying material flux, enabling the deposition of binary, ternary, and higher-order alloys with continuous composition variation across a substrate, allowing for easy scalability and high compositional resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multilayer deposition with automated shutters and masks is used to cover large portions of phase diagrams, then composition coverage is improved, but deposition speed decreases and sample preparation time increases
Solution Approach 1:
The system employs a rotatable substrate holder that dynamically changes the substrate's orientation relative to fixed sputter targets during deposition. This dynamic positioning allows continuous composition variation without requiring complex moving masks or shutters, maintaining high deposition speed while achieving comprehensive phase diagram coverage.
Solution Approach 2:
Instead of varying composition through multiple deposition layers (vertical dimension), the invention varies composition by rotating the substrate to different angular positions relative to the targets (angular dimension). This transforms the composition control from a temporal/multilayer process to a spatial/angular process, enabling single-layer combinatorial samples with full composition coverage.
2Adaptability or versatility
If complex masks and multiple targets are used for combinatorial deposition, then composition variation range is improved, but device complexity and processing time increase
Solution Approach 1:
A single set of fixed sputter targets serves multiple functions by depositing different elements at different angular positions on the rotating substrate. The same targets that would traditionally require complex masking to create composition gradients now directly create combinatorial libraries through substrate rotation alone, eliminating the need for specialized masks.
Solution Approach 2:
The invention extracts and removes the complex mask and shutter systems from the deposition apparatus, relying instead on the simple rotatable substrate holder to control composition. This extraction simplifies the device while maintaining or enhancing composition variation capabilities.
3Adaptability or versatility
If substrate is moved over different sputter targets in multilayer approach, then composition coverage is improved, but deposition time increases and homogeneity decreases
Solution Approach 1:
The substrate rotates continuously during deposition, ensuring continuous and uniform exposure to sputtered material from all targets. This continuous rotation eliminates the discontinuous layer-by-layer deposition of multilayer approaches, improving composition homogeneity while maintaining comprehensive coverage.
Solution Approach 2:
The invention merges all composition variations into a single continuous deposition layer rather than creating separate multilayers. By rotating the substrate through all angular positions during one continuous deposition process, all compositions are formed simultaneously in a single homogeneous layer, eliminating the need for repeated deposition and annealing cycles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the efficient deposition of a wide range of compositions in a single run, achieving high uniformity and resolution in composition gradients, allowing for the production of samples with varying compositions across large areas, including quaternary and higher-order alloys, with the ability to produce multiple samples simultaneously and integrate with conventional deposition systems.
Implementation Method 1
combinatorial sputtering
Data Source
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AI summary
A system for combinatorial deposition of a thin layer on a substrate is described. The system comprises at least one deposition material source holder and a substrate holder. The system also comprises a rotatable positioning system for subsequently positioning the at least one substrate in parallel and in non-parallel configuration with at least one deposition material source. The system comprises at least one mask holder arranged for positioning a mask between at least one of the target holder and the positioning system, for allowing variation of the material flux across the at least one substrate when the combinatorial deposition is performed. The mask holder is in a fixed arrangement with respect to the at least one deposition material source holder during the combinatorial depositing.