Compact Eye Module Layout for Digital Photolithography
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Solution Overview
Problem
Current photolithography processes for creating patterns on large area substrates, such as those used in LCD manufacturing, face challenges in achieving precise and cost-effective pattern creation to meet consumer demands.
Innovation Solution
The development of compact image projection apparatuses incorporating a light pipe, frustrated prism assembly, digital micro-mirror devices, beamsplitters, projection optics, and a focus actuator, which allow for efficient and precise projection of images onto substrates, enabling high-throughput and easy alignment of multiple units in a system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If traditional photolithography apparatuses are used for large area substrates, then pattern creation capability is provided, but the apparatus size is large and alignment in multi-unit systems is difficult
Solution Approach 1:
The photolithography system is divided into multiple independent modular units, each capable of projecting patterns onto specific regions of large substrates. These modular units can be independently manufactured, aligned, and replaced, resolving the contradiction between system size and alignment precision through segmented modular architecture
Solution Approach 2:
The patent transitions from a monolithic large-scale apparatus to a multi-unit modular configuration arranged in arrays. By organizing units in two-dimensional arrays that can be scaled horizontally rather than requiring one large vertical apparatus, the system achieves large substrate coverage while maintaining compact individual unit sizes and simplified alignment
2Productivity
If multiple image projection apparatuses are used to increase throughput, then productivity is improved, but system complexity and alignment difficulty increase
Solution Approach 1:
Each modular photolithography unit is designed with universal interfaces and standardized optical paths that allow identical units to be replicated and arranged in arrays. This universality enables increased throughput through parallel processing of multiple substrate regions while keeping individual unit complexity low and system integration straightforward
Solution Approach 2:
Multiple modular units are combined in arrays to form a complete photolithography system. By merging identical functional units rather than creating one large complex apparatus, the system achieves high throughput through parallel operation while maintaining the simplicity and ease of alignment characteristic of compact modular designs
3Ease of manufacture
If compact modular design is used, then ease of alignment and replacement is improved, but manufacturing complexity of individual components increases
Solution Approach 1:
The system is segmented into standardized modular units with defined interfaces and mounting configurations. This segmentation enables straightforward assembly and replacement of individual units while distributing the optical complexity across multiple identical components rather than requiring one extremely complex integrated system
Solution Approach 2:
The modular units employ fixed optical parameters and standardized component specifications that simplify manufacturing. By standardizing parameters such as optical path lengths, mirror positions, and mounting hole patterns across all units, the system achieves ease of assembly and replacement while the repeated production of identical components offsets the complexity through economies of scale
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise and cost-effective pattern creation on large area substrates, improving throughput and allowing for easy maintenance by enabling the alignment and replacement of multiple compact image projection apparatuses, thus addressing the need for efficient photolithography processes.
Implementation Method 1
a light pipe coupled to a first mounting plate
Implementation Method 2
a frustrated prism assembly, one or more digital micro-mirror devices
Implementation Method 3
one or more digital micro-mirror devices coupled to the frustrated prism assembly
Implementation Method 4
one or more projection optics coupled to the one or more beamsplitters, a projection lens
Data Source
AI summary
Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.