Integrated Pressure Control Valve for Compact Gas Flow Regulation
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Solution Overview
Problem
Existing pressure control devices for semiconductor manufacturing equipment are bulky and difficult to compact, making it challenging to accurately control gas pressure and measure flow rates in a limited space, especially with increasing numbers of gas supply lines.
Innovation Solution
A compact pressure control device design featuring a pressure control valve, a flow resistance, and pressure sensors, where an arithmetic control circuit adjusts the valve opening based on downstream pressure sensor output, allowing for accurate pressure control and flow rate measurement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a conventional pressure control device is used, then pressure control function is provided, but the device occupies large space and is difficult to compact
Solution Approach 1:
The patent combines multiple functions (pressure control, flow rate measurement, and temperature monitoring) into a single integrated device housing. The pressure control valve, flow rate sensor, and temperature sensor are all mounted within the same device body, eliminating the need for separate instruments and reducing overall space occupation while maintaining functional reliability
Solution Approach 2:
The pressure control device is designed to perform multiple functions simultaneously: pressure regulation through the pressure control valve, flow rate measurement via the thermal flow rate sensor, and temperature monitoring through the temperature sensor. This multi-functionality allows a single compact device to replace what would traditionally require multiple separate instruments
2Manufacturing precision
If the number of gas supply lines is increased, then more precise temperature control is achieved, but the installation space for control instruments increases
Solution Approach 1:
Each pressure control device is designed as a self-contained unit that can independently control pressure and measure flow rate for individual gas supply lines. The device housing integrates multiple sensors and control elements, allowing one compact unit to manage what would otherwise require multiple separate instruments per gas line
Solution Approach 2:
The patent transitions from a horizontal arrangement of multiple separate instruments to a vertical integration within a compact housing. By stacking functional components (pressure valve, flow sensor, temperature sensor) vertically within the same footprint, the device reduces the horizontal space required while supporting multiple gas supply lines
3Measurement precision
If a thermal flow rate sensor is built-in upstream of the pressure control valve, then flow rate measurement capability is provided, but the device complexity increases
Solution Approach 1:
The patent integrates the thermal flow rate sensor, temperature sensor, and pressure control valve into a single unified device housing with a common flow path. This merging of components reduces the overall system complexity compared to having separate instruments, while maintaining the ability to measure flow rate accurately through the thermal conductivity of the gas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The compact pressure control device effectively controls gas pressure and measures flow rates with high accuracy, reducing space requirements and enabling precise temperature control of semiconductor substrates.
Implementation Method 1
a built-in thermal flow rate sensor is provided upstream of the pressure control valve
Implementation Method 2
control the pressure of the downstream backside gas to a desired value based on the output of the pressure sensor
Implementation Method 3
The cooling gas can promote heat exchange between the back surface of the substrate and the mount table
Data Source
AI summary
A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.