Compact Scrubber for Semiconductor Effluent Gas Abatement
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Solution Overview
Problem
Current abatement systems for semiconductor manufacturing effluent gases are large, energy-intensive, and complex, failing to efficiently treat the diverse harmful compounds present in these gases.
Innovation Solution
A compact scrubber system comprising two chambers coupled by a conduit, where the first chamber buffers effluent gases and the second chamber treats them with water and a reagent, reducing the burden on primary abatement units.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If current abatement systems are used to treat effluent gases, then harmful compounds can be abated, but the systems occupy a large footprint and consume enormous energy
Solution Approach 1:
The abatement system is divided into multiple chambers with distinct functions: a first chamber for initial treatment and a second chamber for further treatment. This segmentation allows each chamber to be optimized for specific treatment tasks, reducing overall energy consumption while maintaining effective abatement of harmful compounds
Solution Approach 2:
A conduit with a specific configuration (second end disposed below the second inlet and first outlet) acts as an intermediary element between chambers, facilitating efficient gas flow and treatment progression. This intermediary structure enables the system to achieve effective abatement with reduced energy input compared to conventional single-chamber systems
2Object-affected harmful factors
If current abatement systems are used to treat effluent gases, then harmful compounds can be abated, but the systems occupy a large footprint
Solution Approach 1:
The system is segmented into compact multi-functional chambers that perform multiple treatment operations in sequence. This segmentation enables effective abatement of harmful compounds within a reduced physical footprint compared to conventional single-chamber systems
Solution Approach 2:
The conduit structure is nested within the chamber configuration, with the second end of the conduit positioned below the second inlet and first outlet. This nested arrangement optimizes space utilization and reduces the overall footprint of the abatement system while maintaining effective treatment capacity
3Object-affected harmful factors
If current abatement systems are used, then effluent gases can be treated, but the systems are complex
Solution Approach 1:
The treatment process is segmented into distinct chambers with specialized functions, where the first chamber performs initial treatment and the second chamber performs further treatment. This segmentation simplifies the overall system design by dividing complex treatment operations into manageable, optimized stages
Solution Approach 2:
Each chamber is designed to perform multiple functions: the first chamber handles initial effluent gas treatment, while the second chamber performs further treatment and byproduct separation. This multi-functionality reduces system complexity by eliminating the need for separate dedicated units for each treatment stage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The compact scrubber effectively treats water-soluble gases like HF and HCl, reducing the energy consumption and physical footprint of abatement systems while maintaining moderate efficiency.
Implementation Method 1
the second chamber treats effluent gases and includes a second inlet configured to receive a reagent
Data Source
AI summary
Disclosed herein are an auxiliary abatement device for abating effluent gases, an abatement system including the auxiliary abatement device, and an abatement method for the abatement system. The auxiliary abatement device includes a first chamber comprising a first inlet configured to receive the effluent gases; and a second chamber configured to treat the effluent gases and comprising a second inlet configured to receive a reagent, a first outlet configured to output treated effluent gases, and a second outlet configured to output a byproduct produced by treating the effluent gases. The first chamber and the second chamber are coupled by a conduit. The abatement system includes a plasma unit and an auxiliary abatement device to partially treat the effluent gases. The abatement system utilizes a primary abatement unit disposed downstream of the plasma unit and the auxiliary abatement device to treat the effluent gases in bulk.


