Composite Charged-Particle Beam System for TEM Sample Preparation
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Solution Overview
Problem
The existing composite charged-particle beam systems face challenges in efficiently preparing TEM samples with minimal damage and high accuracy due to limitations in the arrangement of charged-particle beam apparatuses and the degree of freedom of the sample stage, which restricts the effective use of FIB, SEM, and gas ion beams for semiconductor pattern observation and fabrication.
Innovation Solution
A composite charged-particle beam system is designed with a focused ion beam apparatus, scanning electron microscope, and gas ion beam apparatus, featuring an eucentric tilt mechanism and orthogonal lens-barrel axes to intersect beams at a single point, allowing for precise and damage-reduced sample preparation and observation, with the gas ion beam irradiated at a narrow angle for finishing, enabling efficient TEM sample preparation and observation without moving the stage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple charged-particle beam apparatuses (FIB, SEM, gas ion beam) are integrated into a composite system, then the capability to prepare TEM samples with high accuracy and minimal damage is improved, but the complexity of arranging the apparatuses and coordinating their operations increases significantly
Solution Approach 1:
The patent combines FIB, SEM, and gas ion beam apparatuses into a single composite charged-particle beam system that shares common components including the sample stage, vacuum chamber, and control systems. This merging allows multiple beam types to be applied to the same sample without requiring separate independent systems, thereby improving sample preparation accuracy while managing system complexity through shared infrastructure.
Solution Approach 2:
The sample stage is designed with universal multi-functionality, capable of performing tilt, rotate, and translate operations to accommodate the different beam directions and sample preparation requirements of FIB, SEM, and gas ion beam apparatuses. This multi-functional stage serves all three beam types, reducing the need for separate positioning systems for each apparatus.
2Ease of operation
If the sample stage is designed with high degree of freedom to accommodate multiple beam apparatuses, then the usability of the composite system is improved, but the mechanical complexity and cost of the stage increases
Solution Approach 1:
The sample stage employs dynamic positioning capabilities with tilt and rotate mechanisms that can be adjusted during operation to optimize the sample orientation for different beam types. This dynamic adaptability allows the same stage to serve multiple apparatuses effectively, improving usability while avoiding the need for multiple fixed-position stages.
Solution Approach 2:
The sample stage is segmented into independent functional modules (tilt mechanism, rotate mechanism, translate mechanism) that can operate independently or in combination. This segmentation allows each module to be optimized for its specific function while working together to provide the overall degree of freedom needed for multi-apparatus compatibility.
3Manufacturing precision
If beam apparatuses are arranged near the sample to converge beams effectively, then the beam convergence quality is improved, but the available space for sample tilting and stage movement is reduced
Solution Approach 1:
The system utilizes three-dimensional spatial arrangement where beam apparatuses are positioned at different heights and angles around the sample chamber. The FIB, SEM, and gas ion beam sources are arranged in different spatial dimensions, allowing their beams to converge on the sample from different directions without requiring excessive horizontal space, thus maintaining beam convergence quality while preserving sample tilting space.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables efficient preparation of TEM samples with reduced damage and high accuracy, allowing for continuous observation of the laminating process using SEM, while maintaining the advantage of low-acceleration gas ion irradiation, thereby improving the usability and efficiency of the composite charged-particle beam system for semiconductor fine pattern formation.
Implementation Method 1
a focused ion beam apparatus (4), in which a focused ion beam (14) is emitted
Implementation Method 2
a scanning electron microscope (2), in which an electron beam (5) is emitted
Implementation Method 3
a gas ion beam apparatus (3), in which a gas ion beam (6) is emitted
Data Source
AI summary
There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.