Composite Focused Ion Beam Device Segmentation for Contamination-Free Processing
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Solution Overview
Problem
Conventional composite focused ion beam devices face challenges in rapidly processing samples without contamination, particularly with gallium ion beams, which require lengthy removal processes and can lead to metallic ion implantation, affecting the precision and efficiency of high-resolution observation and processing.
Innovation Solution
A composite focused ion beam device incorporating a plasma type gas ion source for processing and a gas field ion source for observation, with the latter emitting an ion beam of smaller diameter to avoid sample contamination and enable high-resolution imaging, allowing for simultaneous processing and observation without metallic ion implantation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a plasma type gas ion source is used for processing, then processing speed is improved, but sample contamination occurs due to metallic ion implantation
Solution Approach 1:
The system is divided into two separate ion beam irradiation systems: a first system using plasma type gas ion source for processing, and a second system using gas field ion source for observation. This segmentation allows each system to specialize in its function without compromising the other, resolving the contradiction between processing speed and contamination prevention.
Solution Approach 2:
The gas field ion source acts as an intermediary system that enables observation without direct metallic ion implantation. By using a different ion source type for observation, the harmful contamination effect is avoided while maintaining the ability to monitor the processing in real-time.
2Measurement precision
If a gas field ion source is used for observation, then measurement precision is improved, but processing capability is reduced
Solution Approach 1:
The system separates observation and processing functions into two distinct ion beam irradiation systems. The gas field ion source system provides high-resolution observation capability, while the plasma type gas ion source system provides efficient processing capability. This segmentation resolves the contradiction by allowing each system to optimize for its specific function.
Solution Approach 2:
The composite focused ion beam device integrates multiple ion beam systems with different capabilities into a single platform. This multi-functionality allows the system to switch between high-resolution observation and efficient processing modes, resolving the contradiction between measurement precision and processing capability.
3Productivity
If gallium ion beam is used for processing, then processing speed is improved, but time is lost due to lengthy removal process
Solution Approach 1:
The system separates processing and observation functions into different ion beam systems. By using a gas field ion source for observation instead of gallium ion beam, the need for lengthy removal processes is eliminated while maintaining processing speed with the plasma type gas ion source.
Solution Approach 2:
The invention converts the harmful effect of metallic ion implantation into a benefit by using a non-metallic gas ion source for observation. This eliminates the contamination problem that required lengthy removal processes, turning a harmful situation into a beneficial one where no removal is needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid, contamination-free processing and high-resolution observation of samples, improving precision and efficiency by using distinct ion beams for processing and observation, suitable for applications like semiconductor manufacturing and TEM sample preparation.
Implementation Method 1
a first ion beam irradiation system including a plasma type gas ion source for generating a first ion
Implementation Method 2
a first ion beam irradiation system including a plasma type gas ion source for generating a first ion
Implementation Method 3
a second ion beam irradiation system including a gas field ion source (also referred to as an electric field ionized gas ion source) for generating a second ion
Data Source
AI summary
A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.