Composite Photon Sieve for High-Resolution Photolithography
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Solution Overview
Problem
Projection-type photolithography systems require large and costly projection objective lenses with high numerical apertures for high imaging resolution, but these systems are inefficient and costly, and direct writing systems lack batch processing capabilities.
Innovation Solution
A projection-type photolithography system using a composite photon sieve, comprising a transparent base substrate with a light-proof metal film and a series of transparent annular zones and holes, which replaces the traditional projection objective lens to achieve high imaging resolution and efficiency while allowing batch processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a projection objective lens with large numerical aperture is used to achieve high imaging resolution, then imaging resolution is improved, but device complexity and manufacturing cost increase significantly
Solution Approach 1:
The patent replaces the complex projection objective lens (mechanical optical system) with a photon sieve (diffractive optical element). The photon sieve uses diffraction theory to focus light and form images, eliminating the need for complex lens assemblies with large numerical apertures. This substitution maintains imaging resolution while dramatically reducing device complexity and manufacturing cost.
Solution Approach 2:
The patent changes the fundamental operating parameter from numerical aperture (lens-based) to diffraction order (photon sieve-based). By using the photon sieve's diffraction properties, the system achieves high resolution without requiring large numerical aperture, thereby simplifying the optical system while maintaining manufacturing precision.
2Manufacturing precision
If a projection objective lens is used to achieve high imaging quality, then imaging quality is improved, but system volume and weight increase
Solution Approach 1:
The patent replaces the bulky projection objective lens with a thin photon sieve element. The photon sieve achieves imaging through diffraction rather than refractive lens focusing, resulting in a much thinner and lighter component that maintains high imaging quality while significantly reducing system volume and weight.
3Ease of manufacture
If direct writing photolithography systems use zone plate or photon sieve to eliminate mask plate, then manufacturing cost and system volume are reduced, but batch processing capability is lost and efficiency decreases
Solution Approach 1:
The patent merges the photon sieve with the mask plate into a single integrated component. The mask plate contains both the pattern information and the photon sieve structure, allowing the system to maintain batch processing capability through the mask plate while using the photon sieve's diffractive properties to reduce cost and volume. This combination resolves the contradiction between simplified manufacturing and batch processing efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system improves photolithography efficiency, reduces costs, and minimizes system volume by using a composite photon sieve, offering better aberration characteristics and increased Signal-to-Noise Ratio compared to conventional systems.
Implementation Method 1
The plurality of transparent holes can constitute a first order diffractive photon sieve portion of the composite photon sieve 3, and the series of transparent annular zones can constitute a third order diffractive zone plate portion of the composite photon sieve 3
Data Source
AI summary
The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve. According to the present disclosure, because the composite photon sieve is used instead of a projection objective lens in a conventional projection-type photolithography system, the advantage of high efficiency in the conventional projection-type photolithography system can be reserved, and also photolithography can be performed in batches rapidly, so that photolithography efficiency can be improved. Meanwhile, costs can be effectively cut down and the system can be reduced in size.