Composite PVD Targets for High-Throughput Optical Film Deposition
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Solution Overview
Problem
Conventional multi-cathode physical vapor deposition (PVD) systems using smaller targets for titanium and silicon deposition suffer from low deposition rates and require precise power tuning, limiting throughput and increasing production costs in optical applications where tunable refractive index materials like TixSiyOz are needed.
Innovation Solution
The development of composite PVD targets with a diameter of at least 200 mm, featuring a uniform distribution of silicon and titanium materials in various patterns on the target face, allowing for single-target processing that mimics multi-cathode systems, thereby increasing deposition rates and reducing the need for precise power adjustments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multi-cathode chambers use smaller separate targets for Ti and Si deposition, then composition control is improved, but deposition rate decreases
Solution Approach 1:
The patent combines multiple target materials (Ti, Si, and others) into a single composite PVD target with a large diameter (at least 200 mm). The target face contains multiple material regions arranged in specific patterns, allowing deposition of complex compositions (e.g., TixSiyOz) from one target rather than alternating between multiple separate targets in a multi-cathode chamber.
Solution Approach 2:
The composite target incorporates different material compositions in specific spatial regions of the target face. Each region has locally optimized material properties to deposit specific components of the desired film composition, enabling precise compositional control while maintaining a large overall target area for high deposition rates.
2Device complexity
If multi-cathode chambers use smaller targets, then chamber size constraints are satisfied, but production time increases
Solution Approach 1:
The invention consolidates multiple target functions into a single large-diameter composite target, eliminating the need for multi-cathode chamber configurations. This single-target approach reduces chamber complexity and allows continuous deposition without the time-consuming alternation between multiple targets, thereby reducing production time.
3Manufacturing precision
If conventional targets are used in MC chambers, then composition tuning is possible, but power adjustment complexity increases
Solution Approach 1:
The desired material composition is pre-configured in the composite target structure during manufacturing. Different material regions are arranged in specific patterns on the target face according to the desired film composition (e.g., TixSiyOz ratios). This preliminary arrangement eliminates the need for complex real-time power adjustment during deposition, as the composition is inherently built into the target geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables higher deposition rates and more accurate control of ternary film composition, enhancing the efficiency and cost-effectiveness of producing materials with tunable refractive indices for optical applications by eliminating the need for multiple targets and reducing the complexity of power tuning.
Implementation Method 1
Composite PVD targets are described herein that include at least two materials and have various patterns on the target face
Implementation Method 2
power is alternated between the two or more material targets in order to tune the amount of target material sputtered from each target
Data Source
AI summary
Embodiments of the present disclosure generally relate to composite PVD target. The target has a diameter, a connection face, a substrate face opposite the connection face, a thickness between the connection face and the substrate face, and a material distribution. The material distribution includes a silicon containing material arranged in a pattern, and a titanium containing material arranged in the pattern. The material distribution is uniform at any point along the thickness.