Composite Resist Composition for Defect Control and CD Uniformity
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Solution Overview
Problem
Existing resist compositions suffer from defects and inadequate critical dimension uniformity (CDU) in forming resist patterns.
Innovation Solution
A resist composition comprising specific structural units and an acid generator, along with optional quenchers and solvents, is used to form resist patterns with fewer defects and improved CDU through application, drying, exposure, and heating steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then the resist pattern formation process is simple, but the CD uniformity and defect reduction are insufficient
Solution Approach 1:
The patent employs a composite resin structure combining two distinct structural units: (I) containing a cyclic hydrocarbon ring with specific substituents and (II) containing a chain or cyclic hydrocarbon group. This composite approach allows the resin to achieve both adequate crosslinking density for CD uniformity and controlled solubility for defect reduction, resolving the contradiction between precision and structural simplicity.
Solution Approach 2:
The patent introduces different functional groups at specific positions within the resin structure. The structural unit (I) provides crosslinking capability through its cyclic ring and substituents, while structural unit (II) provides solubility control through its hydrocarbon groups. This localized functional differentiation enables simultaneous optimization of CD uniformity and defect characteristics.
2Manufacturing precision
If resist composition with acid-labile groups is used, then the pattern formation is achieved, but defects increase and CDU deteriorates
Solution Approach 1:
The patent modifies the chemical parameters of the resin by selecting specific structural units with controlled functionality. By adjusting the types of hydrocarbon groups (chain vs. cyclic) and their positions, the resin achieves optimal crosslinking density for CD uniformity while maintaining appropriate solubility to prevent defects, thus improving reliability without sacrificing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves resist patterns with reduced defects and enhanced CDU, improving the quality and consistency of pattern formation.
Implementation Method 1
an acid generator
Data Source
AI summary
A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:wherein R1 and R2 each represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, X1 and X2 each represent a single bond or *—CO—O—, L1 represents a single bond or a hydrocarbon group which may have a substituent, and —CH2— included in the group may be replaced by —O—, —S—, —SO2— or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and L2 represents a single bond or a hydrocarbon group which may have a substituent, and —CH2— included in the group may be replaced by —O—, —S—, —SO2— or —CO—.