Compositional Inhomogeneous Regions in Semiconductor Layers

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Solution Overview

Problem

Current deep ultraviolet light emitting devices have low wall plug operating efficiencies, and existing semiconductor materials like InGaN and AlGaN suffer from high dislocation densities and nonradiative recombination, limiting their emission efficiency despite carrier localization effects.

Innovation Solution

Incorporating compositional inhomogeneous regions in semiconductor layers with a band gap difference of at least thermal energy and a characteristic size smaller than the inverse of dislocation density, enhancing radiative recombination and reducing nonradiative recombination time by preventing electrons from reaching threading dislocation cores.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If compositional inhomogeneous regions are incorporated in semiconductor layers, then radiative recombination is enhanced and internal quantum efficiency is improved, but device complexity increases due to controlled compositional variations

Engineering Contradiction:
Improveinternal quantum efficiencyVSAvoidcompositional structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies local quality by creating compositional inhomogeneous regions with specific band gap differences (at least thermal energy) and characteristic sizes (smaller than inverse dislocation density) within the semiconductor layer. These localized regions with different compositional properties enhance radiative recombination while maintaining control over the overall device structure.

Inventive Principle:
Principle #3Local quality

2Reliability

If compositional inhomogeneous regions are used to prevent electrons from reaching threading dislocation cores, then nonradiative recombination is reduced, but manufacturing precision requirements increase

Engineering Contradiction:
Improvenonradiative recombination reductionVSAvoidcompositional inhomogeneity control
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent employs parameter changes by specifying precise compositional parameters for the inhomogeneous regions, including band gap difference (at least thermal energy) and characteristic size (smaller than inverse dislocation density). These parameter specifications enable controlled modification of electron transport and recombination behavior while providing guidance for manufacturing processes.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves internal quantum efficiency and overall reliability of the devices by increasing radiative recombination and delaying nonradiative recombination, leading to enhanced performance in ultraviolet light emitting diodes.

Implementation Method 1

carrier localization and lead to an enhancement in the radiative efficiency despite the high dislocation density

Methodology Applied
Scientific EffectCarrier localization:

Implementation Method 2

the luminescence occurs due to radiative recombination of carriers in the self-assembled nanometer-scale localized compositionally inhomogeneous regions

Methodology Applied
Scientific EffectRadiative recombination:

Data Source

PatentUS9406840B2Semiconductor layer including compositional inhomogeneities
Publication Date: 2016.08.02 SENSOR ELECTRONIC TECHNOLOGY INC
  • US9406840B2 patent drawing
  • US9406840B2 patent drawing
  • US9406840B2 patent drawing

AI summary

A device comprising a semiconductor layer including a plurality of compositional inhomogeneous regions is provided. The difference between an average band gap for the plurality of compositional inhomogeneous regions and an average band gap for a remaining portion of the semiconductor layer can be at least thermal energy. Additionally, a characteristic size of the plurality of compositional inhomogeneous regions can be smaller than an inverse of a dislocation density for the semiconductor layer.