Nanoimprint Stamp with Concave Protrusion Ends
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional nanoimprinting methods face difficulties in transferring fine patterns, particularly protrusion patterns of several tens of nanometers or less, resulting in poorly defined fine patterns due to challenges in etching characteristics and three-dimensional patterning.
Innovation Solution
The development of stamps with protrusion patterns featuring end portions with center regions and edge regions, where the edge region is higher than the center region, and the end portion having a concave shape, along with methods for manufacturing these stamps using master molds and ion milling processes, to enhance etching and imprinting processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional stamps with flat end portions are used for nanoimprinting, then the imprinting process can be performed, but the fine patterns (several tens of nanometers or less) cannot be well-defined due to poor etching characteristics
Solution Approach 1:
The stamp's protrusion pattern is designed with non-uniform end portions where the edge regions have different heights than the center regions. This local variation in geometry creates specific meniscus formation during imprinting, improving both fine pattern definition and etching characteristics simultaneously.
Solution Approach 2:
The invention changes the geometric parameters of the protrusion end portions by creating height differences between edge and center regions. This parameter modification alters the meniscus formation dynamics, enabling better pattern transfer and etching performance for nano-scale features.
2Manufacturing precision
If stamps with protrusion patterns of several tens of nanometers or less are used, then fine patterning is attempted, but the patterns cannot be transferred properly onto the resin layer
Solution Approach 1:
By creating local height variations at the protrusion end portions, the stamp generates optimized meniscus formation that facilitates pattern transfer at nano-scale dimensions, making fine patterning both possible and manufacturable.
Solution Approach 2:
The stamp is pre-designed with specific end portion geometries that create favorable meniscus conditions before the actual imprinting process, enabling successful pattern transfer of fine features without requiring complex manufacturing adjustments during operation.
3Productivity
If conventional imprinting methods are used, then the resin layer can be imprinted, but the etching characteristics after imprinting are poor
Solution Approach 1:
The invention modifies the geometric parameters of the stamp protrusions by creating height differences between edge and center regions. This changes the meniscus formation dynamics during imprinting, resulting in improved etching characteristics while maintaining process efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves the characteristics of the imprinting process by allowing for well-defined fine and three-dimensional patterning, facilitating the complete removal of resin layers and exposing substrate portions, thereby enhancing patterning results.
Implementation Method 1
forming a stamp having a protrusion pattern portion that corresponds to the protrusion pattern region by using the master mold
Data Source
AI summary
A stamp includes at least one protrusion on a protrusion pattern, and an end portion of the at least one protrusion may have a non-planarized surface. The end portion of the protrusion may have a concave structure, that is, the end portion includes a center region and an edge region, and the edge region is higher than the center region.