Concentric Flow Reactor Sheath Gas for Nanowire Uniformity

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Solution Overview

Problem

Existing gas phase nanowire synthesis methods without substrates face challenges in achieving stable and uniform growth due to reactor wall effects, non-ideal gas flow conditions, and precursor gas utilization, leading to variability in nanowire sizes and reduced production efficiency.

Innovation Solution

The concentric aerotaxy reactor design, which uses a sheath flow to isolate the precursor gas from the reactor walls, maintaining plug flow conditions and minimizing wall interactions, ensuring consistent process history for catalytic nanoparticles and improving stability and scalability of nanowire growth.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If gas phase synthesis is performed without substrate using conventional reactor design, then nanowire growth can proceed, but wall effects and non-ideal gas flow cause variability in nanowire sizes and reduced production efficiency

Engineering Contradiction:
Improveproduction efficiencyVSAvoidnanowire size uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

A sheath gas flow is introduced as an intermediary between the precursor gas and the reactor wall. This sheath flow acts as a mediator that prevents direct interaction between the precursor gas and reactor wall, eliminating wall effects that cause nanowire size variability while maintaining efficient gas phase synthesis

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention uses controlled gas flow dynamics with a sheath flow configuration to create ideal flow conditions. The sheath gas flows in a manner that maintains laminar flow and prevents turbulence, ensuring uniform nanowire growth while maximizing production efficiency

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Productivity

If precursor gas is allowed to contact reactor walls, then complete utilization of precursor gas can occur, but parasitic reactions increase and material utilization efficiency decreases

Engineering Contradiction:
Improvematerial utilization efficiencyVSAvoidprecursor gas waste
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The sheath gas serves as a protective intermediary layer that prevents precursor gas from contacting the reactor wall. This eliminates parasitic reactions at the wall surface, ensuring that all precursor gas is utilized for productive nanowire synthesis rather than being wasted in unwanted side reactions

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The sheath gas creates an inert environment between the reactive precursor gas and the reactor wall. This inert barrier prevents parasitic reactions by isolating the precursor gas from wall surfaces that would otherwise catalyze unwanted decomposition or side reactions

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in nanowires with controlled dimensions and improved material utilization, reducing size variability and extending reactor maintenance intervals by maintaining consistent process conditions and reducing parasitic reactions.

Implementation Method 1

a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber

Methodology Applied
Scientific EffectSheath flow: Laminar Flow

Data Source

PatentUS11702761B2Concentric flow reactor
Publication Date: 2023.07.18 ALIGNEDBIO AB
  • US11702761B2 patent drawing
  • US11702761B2 patent drawing
  • US11702761B2 patent drawing

AI summary

A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.