Concentric Pumping Ring and Symmetric Flow Valve for Uniform Exhaust
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Solution Overview
Problem
Current substrate processing apparatuses face challenges in achieving variable process volume, improved flow conductance, and process uniformity, especially as technology nodes progress and require increasingly smaller and selective etching capabilities.
Innovation Solution
The exhaust module incorporates a pumping ring with concentric through holes and a symmetric flow valve, allowing for adjustable gas flow between two vacuum pump openings to maintain symmetric and uniform flow, even at high pressures, by directing fluid through a second vacuum pump opening when the primary opening is sealed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single vacuum pump opening is used, then the structure is simple, but the ability to maintain uniform flow across varying pressures is insufficient
Solution Approach 1:
The exhaust module is segmented into multiple vacuum pump openings (first and second vacuum pump openings) positioned at different locations. This segmentation allows each opening to serve specific pressure regimes, with the first opening optimized for lower pressures and the second for higher pressures, thereby maintaining process uniformity across varying pressure conditions while managing structural complexity through modular design
Solution Approach 2:
The system dynamically switches between different vacuum pump openings based on operating pressure conditions. A valve mechanism enables dynamic routing of exhaust flow to the appropriate pump opening, allowing the system to adapt to varying pressure regimes during different process phases (etching vs. deposition), thus maintaining optimal process uniformity across different operating conditions
2Manufacturing precision
If the vacuum pump opening is sealed for high pressure operations, then flow symmetry is maintained, but the exhaust capability is reduced
Solution Approach 1:
A valve mechanism acts as an intermediary between the processing chamber and the two vacuum pump openings. This intermediary component enables controlled routing of exhaust flow, allowing the system to seal the first vacuum pump opening during high-pressure operations while redirecting flow through the second vacuum pump opening, thereby maintaining flow symmetry without sacrificing exhaust capability
Solution Approach 2:
The exhaust module is designed with multi-functionality, where the second vacuum pump opening serves dual purposes: it handles high-pressure exhaust when the first opening is sealed, and can also operate in conjunction with the first opening during lower pressure operations. This universal design ensures exhaust capability is maintained across all pressure regimes while preserving flow symmetry
3Manufacturing precision
If concentric through holes are used in the pumping ring, then flow uniformity is improved, but the device complexity increases
Solution Approach 1:
The pumping ring incorporates concentric through holes arranged in asymmetric patterns relative to the single-axis pump opening. This asymmetric concentric arrangement creates multiple flow paths that compensate for the inherent asymmetry of a single pump opening, distributing exhaust flow more uniformly across the chamber while managing structural complexity through geometric optimization rather than additional components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the processing chamber's ability to maintain uniformity and efficiency across varying pressures, minimizing non-concentric flow non-uniformities and ensuring consistent performance in etching or deposition processes.
Implementation Method 1
The one or more through holes are arranged in a pattern concentric with the first vacuum pump opening
Implementation Method 2
The symmetric flow valve is movable between a raised position allowing for passage through the opening of the substantially ring shaped body and into the vacuum pump opening and a lowered position substantially sealing the opening of the substantially ring shaped body
Data Source
AI summary
An exhaust module for a substrate processing apparatus having a body, a pumping ring, and a symmetric flow valve, is disclosed herein. The body has a first and second vacuum pump opening formed therethrough. The pumping ring is positioned in the body over both the first and second vacuum pump openings. The pumping ring includes a substantially ring shaped body having a top surface, a bottom surface, and an opening. The top surface has one or more through holes formed therein, arranged in a pattern concentric with the first vacuum pump opening. The bottom surface has a fluid passage formed therein, interconnecting each of the one or more through holes. The opening is formed in the substantially ring shaped body, substantially aligned with the vacuum pump opening. The symmetric flow valve is positioned in the body over the pumping ring and movable between a raised position and a lowered position.