Conductive Beam Optic with Internal Heating Element
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Solution Overview
Problem
Ion implanters face frequent maintenance due to particle accumulation on beam optics, leading to decreased production time and increased manufacturing costs, as residues from source gases and wafer compounds build up and cause particulate contamination.
Innovation Solution
The configuration of conductive beam optics within an energy purity module includes an electrostatic filter with entrance and ground electrodes positioned to shield energetic electrodes from back-sputter material, combined with internal heating elements and in-situ plasma cleaning using etchant gases to prevent deposition and maintain optics cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If beam-line components are operated continuously for IC production, then productivity is improved, but particle accumulation on beam optics increases causing performance degradation
Solution Approach 1:
The heating element is activated before ion beam injection to pre-heat the beam optics surfaces. This preliminary heating prevents material condensation and accumulation during subsequent ion implantation operations, maintaining beam optics performance throughout continuous production cycles without requiring shutdowns for maintenance
Solution Approach 2:
The system dynamically controls the temperature of beam optics by adjusting heating element power. By maintaining optimal temperature parameters, the system prevents particle accumulation while enabling continuous operation, thus resolving the contradiction between productivity and reliability
2Reliability
If beam-line components are frequently replaced or manually cleaned, then particle accumulation is reduced, but manufacturing time is lost and costs increase
Solution Approach 1:
The beam optics incorporate internal heating elements that enable self-cleaning during operation. By heating the surfaces, condensed materials are evaporated and removed without external intervention, eliminating the need for frequent manual cleaning or component replacement and preventing production downtime
Solution Approach 2:
The heating elements operate continuously or periodically during ion implantation to maintain clean beam optics surfaces. This continuous preventive action eliminates the need for intermittent maintenance shutdowns, ensuring uninterrupted production while maintaining optical cleanliness
3Reliability
If heating elements are integrated into conductive beam optics, then particle buildup is reduced, but device complexity increases
Solution Approach 1:
The heating elements serve multiple functions: they heat the beam optics to prevent condensation, and their thermal radiation also contributes to evaporating accumulated materials. This multi-functionality reduces the need for additional separate cleaning mechanisms, minimizing the increase in device complexity while maintaining reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces particle buildup on beam optics, enhancing the performance and accuracy of ion implanters by preventing material accumulation and allowing continuous operation with reduced maintenance needs.
Implementation Method 1
at least one conductive beam optic of the plurality of conductive beam optics includes an internal heating element
Implementation Method 2
a plurality of conductive beam optics within the housing, the plurality of conductive beam optics arranged around an ion beam-line
Implementation Method 3
Ion implantation is a process of introducing dopants or impurities into a substrate via bombardment
Data Source
AI summary
Provided herein are approaches for reducing particles in an ion implanter. An electrostatic filter may include a housing and a plurality of conductive beam optics within the housing. The conductive beam optics are arranged around an ion beam-line directed towards a wafer, and may include entrance aperture electrodes proximate an entrance aperture of the housing. The conductive beam optics may further include energetic electrodes downstream along the ion beam-line from the entrance aperture electrodes, and ground electrodes downstream from the energetic electrodes. The energetic electrodes are positioned farther away from the ion beam-line than the entrance electrodes and the ground electrodes, thus causing the energetic electrodes to be physically blocked from impact by an envelope of back-sputter material returning from the wafer. The electrostatic filter may further include an electrical system for independently delivering a voltage and a current to each of the conductive beam optics.


