Conductive Film Composition for Smooth E-Beam Resist Patterning
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Solution Overview
Problem
The existing conductive compositions used in charged particle beam patterning techniques for semiconductor devices suffer from surface roughness issues and resist loss due to the migration of acidic and basic substances from the conductive film to the resist layer, affecting pattern shape and sensitivity.
Innovation Solution
A conductive composition is developed that includes a conductive polymer with acidic groups, a basic compound, and a nitrogen-containing heterocyclic compound, along with a water-soluble polymer, which suppresses the migration of acidic substances and improves surface smoothness and conductivity by forming a stable salt and enhancing the stability of the conductive film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conductive composition containing a conductive polymer with acidic groups is applied to form a conductive film, then electrical conductivity is improved, but acidic and basic substances migrate to the resist layer causing pattern shape changes and sensitivity shifts
Solution Approach 1:
A basic compound is introduced as an intermediary substance between the conductive polymer and the resist layer. This basic compound reacts with and neutralizes acidic substances that migrate from the conductive polymer, preventing them from causing harmful effects on the resist layer while maintaining the electrical conductivity function.
Solution Approach 2:
The conductive composition is formulated as a composite material containing multiple components: conductive polymer (for conductivity), basic compound (to neutralize acids), and water-soluble polymer (to suppress migration). This composite structure allows simultaneous achievement of electrical conductivity and suppression of harmful substance migration.
2Reliability
If a conductive film is formed on the resist layer to prevent charge-up, then pattern formation is improved, but surface roughness increases affecting fine pattern shapes
Solution Approach 1:
A water-soluble polymer is added to the conductive composition to form a composite material. This water-soluble polymer acts as a matrix that provides a smooth surface structure, reducing surface roughness while maintaining the electrical conductivity needed for pattern formation.
Solution Approach 2:
The composition parameters of the conductive film are optimized by adjusting the ratios and types of polymers used. By changing the chemical composition and physical properties of the conductive film material, both surface smoothness and electrical conductivity are improved simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The conductive composition effectively reduces resist loss and improves the surface smoothness and conductivity of the conductive film, maintaining pattern integrity and sensitivity during the patterning process.
Implementation Method 1
a basic compound (B), which reacts with an acidic substance to form a stable salt
Implementation Method 2
a conductive polymer (A) having an acidic group... showing conductivity without addition of a dopant
Data Source
AI summary
The conductive composition of the present invention includes a conductive polymer (A) having an acidic group, and a basic compound (B) having a cyclic amide and an amino group in its molecule. The conductive film of the present invention is formed from the conductive composition. The laminate of the present invention includes a substrate; an electron beam resist layer, formed on at least one surface of the substrate; and a conductive film formed on the electron beam resist layer.