Conductive Floating Mask Nanoprinting for 3D Structure Shape Control

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Solution Overview

Problem

Existing ion-assisted three-dimensional nanoprinting technologies face challenges in precisely controlling the size and shape of nanostructures due to difficulties in adjusting the amount of ions accumulated in the non-conductive mask, which affects the formation of electrostatic lenses.

Innovation Solution

A method involving the use of a conductive mask with adjustable electric fields and substrates to form electrostatic lenses, allowing precise control of nanoparticle passage and deposition on a lower substrate through controlled electric field intensity and substrate movement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a non-conductive floating mask is used in ion-assisted three-dimensional nanoprinting, then the process can be performed at room temperature and pressure with high purity, but it is difficult to adjust the amount of ions accumulated in the mask, making it difficult to precisely control the size of the nanostructure

Engineering Contradiction:
Improvecontrol precision of nanostructure sizeVSAvoidease of adjusting ion amount in mask
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent replaces the non-conductive mask with a conductive mask that can be directly controlled by electric field. Instead of relying on ion accumulation in a non-conductive mask, the conductive mask uses electrostatic attraction directly to control nanoparticle deposition, enabling precise adjustment of nanoparticle amount and distribution through voltage control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the material property of the mask from non-conductive to conductive, allowing direct electrical control. By adjusting the voltage applied to the conductive mask, the electric field strength can be precisely controlled to regulate nanoparticle accumulation and deposition, thereby controlling nanostructure size with high precision.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If existing nanoprinting technology using ink is used, then three-dimensional structures can be produced, but the purity of components is low and special environments such as vacuum are required

Engineering Contradiction:
Improvepurity of structure componentsVSAvoidcomplexity of required environment
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the ink component from the nanoprinting process entirely. Instead of using liquid ink that requires vacuum environments to prevent evaporation and contamination, the conductive mask method uses direct electrostatic deposition of charged nanoparticles, achieving high purity without requiring vacuum or special environmental controls.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the liquid ink-based deposition system with an electrostatic field-based system. The conductive mask uses electric fields to directly attract and deposit charged nanoparticles onto the substrate, eliminating the need for vacuum environments required by ink-based methods while maintaining high component purity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise control over the size and shape of three-dimensional structures by adjusting electric field intensity and substrate movement, enabling uniform and impurity-free manufacturing of nanostructures.

Implementation Method 1

forming an electrostatic lens around the hole of the mask by generating electric fields of different sizes in the conductive mask and the lower substrate, respectively

Methodology Applied
Scientific EffectElectrostatic lens: Electrostatic Lens

Implementation Method 2

introducing charged nanoparticles through an upper inlet of the reactor to induce passage through the mask hole by the electrostatic lens and deposition on the lower substrate

Methodology Applied
Scientific EffectElectric field: Electric Field

Data Source

PatentUS20250375815A1Method for manufacturing three-dimensional structure using conductive floating mask
Publication Date: 2025.12.11 GLOBAL FRONTIER CENT FOR MULTISCALE ENERGY SYST
  • US20250375815A1 patent drawing
  • US20250375815A1 patent drawing
  • US20250375815A1 patent drawing

AI summary

The present invention may be configured to: apply, while maintaining a separation distance (d) between a substrate and a conductive mask, different electric potentials to each of the substrate and the mask to form an electric field due to an electric potential difference; to make charged nanoparticles pass through a hole of the mask according to the intensity of the electric field to determine the degree to which the charged nanoparticles are focused on the substrate; and control the size and shape of a three-dimensional structure formed by depositing the nanoparticles on the substrate according to the focusing degree.