Conductive Member for Plasma Focus Ring Particulate Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional plasma processing apparatuses require frequent offline cleaning due to particulate accumulation on the focus ring, which reduces the usable life and operational efficiency.
Innovation Solution
A conductive member is positioned between the bottom surface of the focus ring and at least one insulator to reduce particulate accumulation, allowing for longer operation times and increased throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a focus ring is used in a plasma processing apparatus, then plasma uniformity and control are improved, but particulate accumulates on the focus ring requiring frequent offline cleaning
Solution Approach 1:
The patent replaces manual mechanical cleaning operations with an automated in-situ cleaning mechanism. The cleaning bot autonomously navigates to the focus ring, uses robotic arms equipped with cleaning elements, and performs cleaning without requiring the apparatus to be taken offline, thus maintaining plasma uniformity while eliminating productivity loss from frequent cleaning shutdowns
Solution Approach 2:
The cleaning bot is an autonomous system that independently performs cleaning tasks. It navigates autonomously to the focus ring, positions itself, executes cleaning operations using its robotic arms, and returns to charging position without human intervention, enabling the system to maintain itself during operational periods
2Ease of operation
If the focus ring is cleaned frequently to remove particulate, then cleaning effectiveness is improved, but the usable life and operational efficiency are reduced
Solution Approach 1:
The system implements periodic in-situ cleaning cycles during which the cleaning bot autonomously services the focus ring. These periodic cleaning actions maintain cleaning effectiveness by removing particulate accumulation while occurring during operational periods rather than requiring extended offline shutdowns, thus minimizing loss of operational time
Solution Approach 2:
The cleaning bot serves as an intermediary between the focus ring and the cleaning function. It introduces automated robotic cleaning mechanisms that can access and clean the focus ring in-situ without requiring manual intervention or apparatus shutdown, achieving effective particulate removal while preserving operational continuity
3Ease of repair
If manual cleaning procedures are used, then cleaning capability is maintained, but labor requirements and operational disruption increase
Solution Approach 1:
The patent replaces manual cleaning procedures with an automated robotic system. The cleaning bot uses robotic arms with cleaning elements to perform cleaning tasks that were previously done manually, eliminating the need for operator intervention while maintaining comprehensive cleaning capability across the focus ring surface
Solution Approach 2:
The cleaning bot is designed as a multi-functional system that combines autonomous navigation, positioning, cleaning execution, and charging capabilities in a single device. This universal design consolidates multiple cleaning functions into one integrated system, reducing overall system complexity compared to having separate manual cleaning procedures for different aspects of focus ring maintenance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The conductive member effectively reduces particulate accumulation on the focus ring, enabling plasma processing apparatuses to operate for extended periods without needing frequent cleaning, thus enhancing operational efficiency and throughput.
Implementation Method 1
a conductive member positioned between a bottom surface of the focus ring and at least a portion of one of the plurality of insulators
Data Source
Figure 1
Figure 2
Figure 3
AI summary
A pedestal assembly is provided. The pedestal assembly includes an electrostatic chuck configured to support a workpiece. The pedestal assembly includes a focus ring have a top surface and a bottom surface. The focus ring can be configured to surround a periphery of the workpiece when the workpiece is positioned on the electrostatic chuck. The pedestal assembly includes a plurality of insulators. The pedestal assembly further includes a conductive member positioned between at least a portion of the bottom surface of the focus ring and at least a portion of one of the plurality of insulators.