Conductive Oxide Capacitor Layout for Simpler Display Fabrication
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Solution Overview
Problem
Conventional display device manufacturing methods require additional metal and insulation layers for capacitor electrode formation, leading to inefficiencies in the process.
Innovation Solution
A display device is manufactured using a conductive oxide capacitor electrode formed during the process of creating an active pattern, eliminating the need for a metal layer and insulation layer typically used in conventional methods, with a method involving the formation of an oxide semiconductor layer, conductive oxide layer, and photoresist patterns to etch and pattern the semiconductor and conductive patterns, and subsequent annealing to crystallize the conductive patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional methods use additional metal and insulation layers for capacitor electrode formation, then the capacitor structure is complete and functional, but the manufacturing process becomes more complex and less efficient
Solution Approach 1:
The invention merges the capacitor electrode formation with the active pattern formation by using the same conductive oxide layer for both purposes. The conductive oxide layer is selectively etched to create both the active pattern and the capacitor electrode, eliminating the need for separate metal and insulation layers that would otherwise be required for capacitor construction.
Solution Approach 2:
The conductive oxide layer serves multiple functions: it forms the active pattern for transistor operation and simultaneously creates the capacitor electrode. This multi-functional approach allows a single layer to fulfill multiple structural roles, reducing overall device complexity and streamlining the manufacturing process.
2Reliability
If conventional methods include metal and insulation layers for capacitor electrodes, then the capacitor can be formed, but the manufacturing time and process steps increase
Solution Approach 1:
The conductive oxide layer is deposited and prepared in advance as part of the active pattern formation process, before any capacitor-specific structures are created. This preliminary preparation allows the capacitor electrode to be formed simultaneously with the active pattern through selective etching, rather than requiring separate subsequent steps for capacitor construction.
Solution Approach 2:
The formation of the active pattern and capacitor electrode are merged into a single etching process. By using the same conductive oxide layer and applying selective etching techniques, both structures are created in one operation, significantly reducing manufacturing time and improving productivity compared to conventional sequential processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves manufacturing efficiency by omitting the metal and insulation layers required in conventional methods, streamlining the process and enhancing the electrical characteristics of the semiconductor patterns.
Implementation Method 1
subsequent annealing to crystallize the conductive patterns
Implementation Method 2
The conductive oxide layer and the oxide semiconductor layer are etched to form a first semiconductor pattern under the first photoresist pattern
Data Source
AI summary
According to some embodiments of the present disclosure, a display device includes an active pattern including a metal oxide, a gate electrode overlapping the active pattern, a first capacitor electrode spaced apart from the active pattern and including a conductive oxide, and a second capacitor electrode on the first capacitor electrode.