Conductive Polymer Composition for Electron Beam Resist Antistatic Film
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Solution Overview
Problem
Current conductive polymer compositions for electron beam lithography face challenges such as acid diffusion, poor film-formability, and insufficient antistatic properties due to the use of strong bases and low hydrophilicity, leading to sensitivity fluctuations and pattern defects in lithography.
Innovation Solution
A conductive polymer composition comprising a polyaniline-based conductive polymer with a repeating unit containing an acidic group and an addition salt structure, along with a nonionic surfactant and a water-soluble polymer, which enhances charge dissipation, film-formability, and peelability, minimizing acid diffusion and improving antistatic properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a polyaniline-based conductive polymer with acidic groups is used to form an antistatic film, then charge dissipation ability is improved, but acid diffusion to the resist causes sensitivity fluctuations and pattern defects
Solution Approach 1:
A basic compound is introduced as an intermediary substance between the acidic polyaniline conductive polymer and the resist. This basic compound neutralizes the acid generated during electron beam irradiation, preventing it from diffusing into the resist and causing defects, while allowing the conductive polymer to maintain its charge dissipation function.
Solution Approach 2:
The invention creates a composite film structure combining the polyaniline-based conductive polymer with a basic compound. This composite material integrates the antistatic properties of the conductive polymer with the acid-neutralizing capability of the basic compound, achieving both charge dissipation and acid diffusion prevention simultaneously.
2Reliability
If conventional conductive polymer compositions are used, then charge dissipation is achieved, but film-formability is poor and particle aggregates cause pattern defects
Solution Approach 1:
The invention modifies the chemical structure parameters of the conductive polymer by introducing specific repeating units with acidic groups into the polyaniline backbone. This structural modification improves film-formability and reduces particle aggregation while maintaining conductivity, enabling better pattern quality without sacrificing antistatic properties.
3Object-generated harmful factors
If strong bases are used to neutralize acid, then acid diffusion is reduced, but sensitivity fluctuations occur due to strong basicity effects on the resist
Solution Approach 1:
Instead of using strong bases, the invention employs weak basic compounds with carefully controlled basicity parameters. This parameter adjustment allows sufficient acid neutralization to prevent diffusion while maintaining lithography sensitivity, avoiding the harmful effects of strong bases on the resist system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high-efficiency charge dissipation, improved positional accuracy, and high-resolution patterns in electron beam writing, while reducing acid diffusion and maintaining stability, thus addressing the limitations of existing technologies.
Implementation Method 1
a polyaniline-based conductive polymer having at least one kind of a repeating unit represented by general formula (1)... a high charge dissipation ability is desired as a measure for improving the antistatic property
Implementation Method 2
a substrate is subjected to etching while using a mask having a resist pattern obtained by the results that crosslinking or decomposition reaction of a thin film is induced by irradiation with light
Implementation Method 3
crosslinking or decomposition reaction of a thin film is induced by irradiation with light to change the solubility of the thin film remarkably
Data Source
AI summary
A conductive polymer composition containing: (A) a polyaniline-based conductive polymer having a repeating unit represented by following general formula (1); and (B) polymer having structure represented by following general formula (2). In formulae, each of R1 to R4 represents hydrogen atom, acidic group, hydroxy group, alkoxy group, carboxy group, nitro group, halogen atom, or hydrocarbon group, R5 and R6 each independently represent a hydrogen atom, linear, branched, or cyclic alkyl group having 1-10 carbon atoms or a hydrocarbon group containing a hetero atom, Xa- represents anion, and “a” represents valence. An object of the invention provides a conductive polymer composition which has good filterability and film-formability of flat film on electron beam resist and can be used suitably for antistatic film for electron beam resist writing showing excellent antistatic property in electron beam writing process, and, reducing effect of acid diffused from film to minimum, and also having excellent peelability.