Conductive Polymer Coating Composition for Lithography Pattern Formation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing conductive compositions used in charged particle beam lithography face challenges in achieving both high conductivity and coatability, with additives like surfactants adversely affecting resist characteristics and pattern formation.
Innovation Solution
A conductive composition comprising a conductive polymer, a water-soluble polymer, and a solvent, with specific water-soluble polymers and controlled amounts, along with optional basic compounds, to enhance conductivity and coatability, using a polymerization process with a terminal hydrophobic group.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a surfactant is added to improve the coatability of the conductive composition, then the coatability is improved, but the resist characteristics are adversely affected and predetermined pattern cannot be obtained
Solution Approach 1:
The patent removes the surfactant component from the conductive composition entirely. Instead of using a surfactant-containing system, the invention employs a conductive polymer composition that achieves adequate coatability without surfactants, thereby eliminating the adverse effect on resist characteristics and pattern formation
Solution Approach 2:
The patent uses a composite conductive polymer system comprising polyaniline and its derivatives combined with specific conductive inorganic materials. This composite approach provides sufficient coatability and conductivity without requiring surfactants, thus resolving the contradiction between coatability and pattern formation quality
2Reliability
If the conductivity of the coating film is increased, then the antistatic function is improved, but the coatability and resist characteristics deteriorate
Solution Approach 1:
The patent employs a composite system combining organic conductive polymers (polyaniline and derivatives) with inorganic conductive materials. This composite structure achieves high conductivity and excellent antistatic function while maintaining good coatability, as the organic polymer matrix provides a coatable formulation that can be uniformly applied
Solution Approach 2:
The patent optimizes the molecular weight, composition ratio, and structural parameters of the conductive polymer components. By controlling these parameters, the formulation achieves a balance between conductivity (for antistatic function) and coatability, allowing the coating to be applied uniformly without sacrificing antistatic performance
3Ease of operation
If the amount of water-soluble polymer is increased to improve coatability, then the coatability is improved, but the conductivity of the coating film decreases
Solution Approach 1:
The patent precisely controls the molecular weight and composition ratio of the water-soluble polymer component. By optimizing these parameters, the formulation achieves sufficient coatability while minimizing the dilution effect on conductivity. The water-soluble polymer serves as a binder rather than a dominant component, allowing good coating formation without excessive conductivity reduction
Solution Approach 2:
The patent uses a composite system where the water-soluble polymer is combined with highly conductive inorganic materials and conductive polymer components. This composite structure ensures that even with the presence of water-soluble polymer for coatability, the overall conductivity remains high due to the conductive network formed by the other components
Data Source
AI summary
A conductive composition may include a conductive polymer (A), a water-soluble polymer (B), and a solvent (C1). The water-soluble polymer (B) may include a water-soluble polymer (B11) of formula (11), and a water-soluble polymer (B2) of formula (2) as the water-soluble polymer (B) of 0.15% by mass or less, based on a total mass of the conductive composition:wherein R1 is a linear or branched alkyl group with 6 to 20 carbon atoms, each of R4 and R5 is independently a methyl or ethyl group, R6 is a hydrophilic group, R7 is H or a methyl group, Y1 is a single bond, —S—, —S(═O)—, —C(═O)—O—, or —O—, Z is a cyano group or a hydroxy group, each of p1 and q is an average number of repetitions, and is a number of from 1 to 50, and m is a number of from 1 to 5.