Conductive Si-Zr-O Sputter Targets for Stable High-Rate Oxide Deposition

The patent applies composite materials by combining conductive metal particles (silver, gold, copper, or their alloys) with ceramic oxide material (such as Al2O3, SiO2, TiO2, ZrO2, or their mixtures) to create a composite sputter target. This composite structure provides both the ceramic's ability to reduce hysteresis and the metal's electrical conductivity, enabling the use of simpler DC or low-frequency AC power systems while maintaining high deposition rates. The metal particles are distributed throughout the ceramic matrix, creating conductive pathways that facilitate electron flow and ion bombardment necessary for efficient sputtering.

The patent changes the electrical parameter of the target material from non-conductive to conductive by incorporating metal particles. This parameter change fundamentally alters the interaction with the power source, allowing the use of DC or low-frequency AC power instead of RF power. The conductive nature of the composite target enables uniform current distribution across the entire target surface, eliminating standing wave effects and ensuring uniform plasma density and film deposition across large areas.

The patent uses composite materials where ceramic oxide particles are embedded in a conductive metal matrix. The ceramic oxide component (Al2O3, SiO2, TiO2, ZrO2, or their mixtures) provides the oxygen source for oxide layer formation, while the metal matrix (silver, gold, copper, or their alloys) maintains electrical conductivity. This composite structure prevents the severe hysteresis behavior observed in pure metal targets during reactive sputtering with oxygen, as the metal matrix continuously conducts electrons to sustain the plasma discharge, ensuring process stability and reliable oxide layer deposition.

The patent employs composite materials that combine conductive metal particles with ceramic oxide material to create a target that can be effectively sputtered using simple DC or low-frequency AC power systems. The ceramic oxide component (such as Al2O3, SiO2, TiO2, ZrO2, or their mixtures) serves as the source material for oxide film deposition, while the metal component (silver, gold, copper, or their alloys) provides the necessary electrical conductivity. This composite structure enables the use of simple power systems while maintaining effective oxide film deposition capability, resolving the contradiction between power system simplicity and oxide film deposition effectiveness.