Conductive Substrate With Crystalline And Amorphous ITO Layers

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Solution Overview

Problem

Current methods for preparing conducting substrates are complex and costly, involving multiple processes and high resistance losses, particularly in the formation of secondary electrodes for organic light emitting devices and solar cells.

Innovation Solution

A method involving the formation of a crystalline transparent conducting layer, followed by an amorphous transparent conducting layer, patterning to expose the crystalline layer, and deposition of a metal layer in the patterned regions, minimizing resistance loss and reducing the number of processing steps.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a secondary electrode is formed by depositing and patterning metal on fully deposited ITO, then optical efficiency loss is prevented, but the number of processes increases and substrate cost increases

Engineering Contradiction:
Improveoptical efficiencyVSAvoidnumber of processes
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The transparent conducting layer is divided into two segments: a crystalline ITO layer deposited first, followed by an amorphous ITO layer deposited second. This segmentation allows the amorphous layer to be patterned more easily while maintaining good adhesion to the crystalline layer, reducing the complexity of the overall patterning process while preventing optical efficiency loss.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent uses a composite structure of crystalline ITO and amorphous ITO layers. The crystalline layer provides stable adhesion to the substrate, while the amorphous layer offers easier patterning characteristics. This composite material approach resolves the contradiction between maintaining reliability and reducing process complexity.

Inventive Principle:
Principle #40Composite materials

2Area of stationary object

If ITO is fully deposited on substrate to form primary electrode, then coverage is ensured, but resistance loss increases

Engineering Contradiction:
Improveelectrode coverageVSAvoidresistance loss
Core Design Contradiction:
Area of stationary objectVSLoss of energy

Solution Approach 1:

The patent applies different qualities to different regions of the transparent conducting layer. The crystalline ITO layer provides broad coverage with stable adhesion, while the amorphous ITO layer is selectively patterned in specific regions to reduce resistance loss. This local differentiation allows full coverage where needed while minimizing resistance in critical areas.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in an efficient conducting substrate with reduced process complexity and cost, achieved through the integration of an amorphous transparent conducting layer and a metal layer, which minimizes resistance loss and eliminates the need for additional insulating layers.

Implementation Method 1

forming a crystalline transparent conducting layer on a substrate

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 2

forming an amorphous transparent conducting layer on the crystalline transparent conducting layer

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 3

forming a metal layer in the at least one pattern open region

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Data Source

PatentUS10492296B2Conductive substrate and method for manufacturing same
Publication Date: 2019.11.26 LG DISPLAY CO LTD
  • US10492296B2 patent drawing
  • US10492296B2 patent drawing
  • US10492296B2 patent drawing

AI summary

An exemplary embodiment of the present invention comprises: 1) forming a crystalline transparent conducting layer on a substrate; 2) forming an amorphous transparent conducting layer on the crystalline transparent conducting layer; 3) forming at least one pattern open region so as to expose a part of the crystalline transparent conducting layer by patterning the amorphous transparent conducting layer; and 4) forming a metal layer in the at least one pattern open region.