Conductor Pattern for Electric Field Convergence in Plasma Processing
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Solution Overview
Problem
In plasma processing apparatuses, increasing the electric field on the surface of the dielectric to efficiently generate plasma while maintaining the strength of the dielectric is challenging due to the thinness of recessed portions, which can lead to dielectric breakage.
Innovation Solution
A plasma processing apparatus with a conductor pattern on the dielectric surface that converges the electric field corresponding to microwaves, where the conductor pattern is strategically positioned to overlap with slots and has specific length ranges that resonate with the microwaves, enhancing electric field strength without compromising dielectric strength.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a recessed portion is provided on the dielectric surface to converge electric field, then plasma generation efficiency is improved, but dielectric strength is reduced due to thinness of the recessed portion
Solution Approach 1:
A conductor pattern is introduced as an intermediary element on the dielectric surface to converge the electric field. Instead of relying on the dielectric's own recessed structure, the conductor pattern acts as a separate component that focuses the electric field to enhance plasma generation efficiency while preserving the dielectric's structural integrity and strength.
Solution Approach 2:
The electric field convergence function is segmented from the dielectric structure itself and transferred to a separate conductor pattern. This segmentation allows the dielectric to maintain its full thickness and strength while the conductor pattern independently performs the field convergence function through its specific geometric design.
2Productivity
If the dielectric thickness is reduced to enable electric field convergence, then plasma generation efficiency is improved, but reliability is worsened due to increased risk of dielectric breakage
Solution Approach 1:
The conductor pattern serves as an intermediary that enables electric field convergence without requiring reduction of dielectric thickness. The conductor pattern, positioned on the dielectric surface, focuses the electric field to improve plasma generation while the dielectric maintains its full thickness and associated reliability.
Solution Approach 2:
The conductor pattern is strategically positioned in specific regions where electric field convergence is needed, rather than uniformly thinning the dielectric. This localized approach concentrates the electric field enhancement where required while preserving dielectric thickness and reliability in other areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively increases the electric field on the dielectric surface, allowing for efficient plasma generation while maintaining the structural integrity of the dielectric, thus enhancing the plasma processing efficiency.
Implementation Method 1
a conductor pattern that is provided on the facing surface of the dielectric and converges an electric field corresponding to the microwaves radiated from each of the slots
Implementation Method 2
a slot plate provided on a surface of the dielectric opposite to the facing surface and formed with a plurality of slots that radiate the microwaves to the processing space through the dielectric
Implementation Method 3
microwaves for plasma excitation generated by a microwave generator are radiated
Data Source
AI summary
Disclosed is a plasma processing apparatus including: a processing container that defines a processing space; a microwave generator that generates microwaves for plasma excitation; a dielectric having a facing surface that faces the processing space; a slot plate provided on a surface of the dielectric opposite to the facing surface and formed with a plurality of slots that radiate the microwaves to the processing space through the dielectric; and a conductor pattern that is provided on the facing surface of the dielectric and converges an electric field corresponding to the microwaves radiated from each of the slots.