Configurable BDC Reticle for Dynamic Holdover Mark Adjustment
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Solution Overview
Problem
Existing ballistic drop compensation (BDC) reticles in optical aiming devices have static holdover marks that do not accurately represent ranges for specific weapon and ammunition pairings, requiring calibration and experience to predict bullet drop, and are not adaptable to different gun and cartridge combinations or user preferences.
Innovation Solution
A configurable BDC reticle system that uses a processor and non-transitory computer-readable storage medium to determine and project customizable BDC patterns based on user-selected ranges and ballistic input data for specific ammunition types, allowing for dynamic adjustment of holdover marks according to ballistic trajectories.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a static BDC reticle pattern is used, then the device structure is simple, but the reticle cannot accurately represent ranges for specific weapon and ammunition pairings
Solution Approach 1:
The patent implements a dynamic BDC reticle system where holdover marks can be repositioned along the reticle based on different ballistic trajectories. The system allows users to configure the vertical position of each holdover mark according to specific weapon and ammunition pairings, transforming the static reticle into an adaptable tool that maintains accuracy across multiple configurations without requiring multiple physical reticles.
Solution Approach 2:
The system changes the positional parameters of holdover marks based on ballistic input data. By adjusting the vertical position parameter of each mark according to calculated bullet drop values for different ammunition types and weapon combinations, the reticle maintains accurate range indication across multiple configurations while using a single physical reticle structure.
2Adaptability or versatility
If fixed-position BDC holdover marks are used, then the reticle design is simple, but the marks do not consistently represent ranges due to varying factors
Solution Approach 1:
The patent creates a universal BDC reticle system that can accommodate multiple weapon and ammunition pairings through a single reticle design. By implementing configurable holdover marks that can be positioned according to different ballistic trajectories, the system eliminates the need for multiple specialized reticles, allowing one reticle to serve multiple functions across different firearm configurations.
3Measurement precision
If custom BDC patterns are created for each weapon and ammunition pairing, then range indication accuracy is improved, but the number of reticles required increases
Solution Approach 1:
The system implements dynamic repositioning of holdover marks on a single reticle based on selected weapon and ammunition pairings. Instead of requiring multiple static reticles, the system allows users to configure the vertical position of each mark according to the specific ballistic trajectory, enabling one reticle to provide accurate range indication for multiple different firearm configurations.
Data Source
AI summary
A system, method, and device for configuring an optical aiming device for ballistic drop compensation (BDC). The optical aiming device can include a housing with a reticle pane defining a reticle display field viewable by a user and indicating a zero point, the housing further including a plurality of axially spaced lenses and defining an optical path therethrough. In various embodiments the system includes a display device configured to project an image generated from a display, a processor, and a non-transitory computer readable storage medium. The computer readable data storage medium can include instructions executable by the processor to receive a first set of ballistics input data indicating a first type of ammunition, determine a BDC pattern including at least two holdover marks corresponding to at least two ranges for the first type of ammunition, and project the BDC pattern onto the reticle display field.


