Conformal Flexible Polishing of Micro Lens Array Molds Without Tool Marks
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Solution Overview
Problem
Traditional polishing methods struggle to effectively polish micro lens array molds due to their small size and high surface quality requirements, often leaving defects like tool marks and scratches, and existing devices are limited in adapting to the curvature of these molds.
Innovation Solution
A conformal flexible polishing method using magnetic field-assisted and shear thickening techniques with adjustable tools and slurries to maintain shape accuracy and remove surface defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional machining methods such as single-point diamond turning are used, then nanoscale surface roughness can be obtained, but tool marks and scratches are left on the surface affecting reproduction accuracy
Solution Approach 1:
The patent replaces traditional mechanical polishing methods with a magnetic field-based polishing system. A magnetic polishing head uses magnetic fields to control abrasive particles, eliminating direct mechanical contact that causes tool marks and scratches while achieving nanoscale surface roughness.
Solution Approach 2:
The patent changes the physical state and control parameters of the polishing process by using magnetic field strength, polarity, and intensity modulation to control abrasive particle behavior, enabling precise material removal without mechanical contact damage.
2Manufacturing precision
If fixed abrasive pad or loose abrasives are used for polishing, then flat surfaces can be polished, but the methods cannot polish micro lens array molds with small feature sizes
Solution Approach 1:
The patent employs a dynamic magnetic polishing head that can adjust its shape, size, and magnetic field distribution in real-time to adapt to different micro lens array configurations. The magnetic field can be dynamically reconfigured to match various feature geometries and sizes.
Solution Approach 2:
The magnetic polishing system serves multiple functions: it can polish different surface types (flat, curved, aspherical), handle various feature sizes (from micrometer to millimeter scale), and process different materials, making it universally applicable to micro lens array molds that traditional methods cannot handle.
3Ease of manufacture
If magnetic suspension polishing device is used for aspheric optics, then no circulation of polishing solution is needed, but the device is limited to larger plane surfaces and cannot polish workpieces with curvature
Solution Approach 1:
The patent uses a flexible magnetic polishing head that can conform to curved surfaces. The magnetic field penetrates through the flexible structure, maintaining control over abrasive particles while adapting to the workpiece geometry, enabling polishing of both flat and curved surfaces.
Solution Approach 2:
The patent extends the magnetic polishing approach from two-dimensional planar surfaces to three-dimensional curved surfaces by incorporating spatially varying magnetic fields that can accommodate complex geometries, adding a dimensional capability that overcomes the planar limitation.
4Manufacturing precision
If butterfly disk is used to grind workpiece, then small bumps can be removed through relative movement, but the disk flexibility is poor and difficult to adapt to changing curvature radius
Solution Approach 1:
The patent changes the physical parameters of the polishing system by using magnetic field intensity, direction, and distribution as controllable parameters. This allows the polishing head to adapt its effective curvature and contact pressure dynamically, unlike the rigid butterfly disk with fixed geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high-quality polishing of micro lens array molds by adapting to their curvature and removing defects without compromising shape accuracy, applicable to both magnetic and non-magnetic materials.
Implementation Method 1
A conformal flexible polishing method for a micro lens array mold, comprising the following steps: Step 1: Conducting Initial Inspection of a Micro Lens Array Mold 3
Implementation Method 2
A conformal flexible polishing method using magnetic field-assisted and shear thickening techniques
Data Source
AI summary
The present invention relates to a conformal flexible polishing method for a micro lens array mold, which realizes conformal flexible polishing. Solution 1: a magnet is installed below a workpiece so that the prepared magnetic slurry is fitted with the surface of the workpiece under the action of magnetic field force to produce a contact pressure; a magnetic polishing tool is installed above the workpiece, and the tool is magnetized; the polishing tool rotates, and the magnetic slurry on the tip end of the tool forms a spherical polishing head. Solution 2: a shear thickening slurry is used, a ball end tool is installed above the workpiece, and the shear thickening slurry is driven through the high-speed rotation of the ball end tool to rotate and produce a relative shear motion so as to carry out polishing under the action of the shear thickening effect.