Conical-Insert Sputtering Target for Uniform Coating Composition

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Solution Overview

Problem

Conventional sputtering targets experience a reduction in the proportion of the second sputtering material forming the inserts relative to the first sputtering material forming the target plate over time, leading to non-uniform layer composition during the sputtering process.

Innovation Solution

A sputtering target design featuring a base plate and a target plate with inserts made of a second sputtering material, which have a conical shape increasing in size across the depth direction, ensuring a higher sputter yield and maintaining a uniform composition throughout the target's useful life.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If conventional sputtering targets with cylindrical inserts are used, then the target can be manufactured with simple geometry, but the layer composition becomes non-uniform over time due to differential wear rates

Engineering Contradiction:
Improvelayer composition uniformityVSAvoidinsert geometry complexity
Core Design Contradiction:
Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The patent applies local quality by giving different geometric forms to different parts of the insert. Specifically, the insert has a conical upper portion and a cylindrical lower portion, where the conical portion compensates for the higher sputter yield material's faster wear rate. This local geometric variation ensures that the insert recedes at a rate matching the target plate, maintaining uniform layer composition throughout the target's service life.

Inventive Principle:
Principle #3Local quality

2Reliability

If inserts with higher sputter yield material are used to enhance coating properties, then the coating quality improves, but the insert wears faster causing composition drift

Engineering Contradiction:
Improvecoating qualityVSAvoidmaterial proportion uniformity
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent applies parameter changes by modifying the geometric parameters of the insert - specifically introducing a conical angle in the upper portion. This geometric parameter change compensates for the material property difference (higher sputter yield) of the insert material. The conical shape ensures that as the insert wears faster due to higher sputter yield, the decreasing cross-sectional area offsets this effect, maintaining stable material proportion and consistent coating quality throughout operation.

Inventive Principle:
Principle #35Parameter changes

3Duration of action of stationary object

If cylindrical inserts are used for simple manufacturing, then production cost is reduced, but the target requires frequent replacement due to composition degradation

Engineering Contradiction:
Improvetarget lifespanVSAvoidinsert manufacturing complexity
Core Design Contradiction:
Duration of action of stationary objectVSEase of manufacture

Solution Approach 1:

The patent applies local quality by differentiating the insert geometry into a conical upper portion and cylindrical lower portion. The conical portion specifically addresses the wear compensation need, while the cylindrical portion maintains manufacturing simplicity. This hybrid approach extends target lifespan by preventing composition degradation, while keeping manufacturing complexity at an acceptable level through the use of standard cylindrical lower sections.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The conical shape of the inserts compensates for the wear rate difference, maintaining a uniform layer composition and extending the target's lifespan by ensuring consistent material distribution during the sputtering process.

Implementation Method 1

A sputtering target is used in sputtering technology, in particular, to coat substrates. In the process, the sputtering target is sputtered by means of particle bombardment.

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentUS12173397B2Sputtering target
Publication Date: 2024.12.24 CEMECON AG
  • US12173397B2 patent drawing
  • US12173397B2 patent drawing
  • US12173397B2 patent drawing

AI summary

The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.